Assessment of MOCVD- and MBE-growth GaAs for high-efficiency solar cell applications

A critical assessment of the photovoltaic quality of epitaxial GaAs grown by metal-organic chemical vapor deposition (MOCVD) and by molecular-beam epitaxy (MBE) is reported. Epitaxial films of nominally identical structure were grown by the two techniques and were fabricated into p-n heteroface sola...

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Veröffentlicht in:IEEE transactions on electron devices 1990-02, Vol.37 (2), p.469-477
Hauptverfasser: Tobin, S.P., Vernon, S.M., Bajgar, C., Wojtczuk, S., Melloch, M.R., Keshavarzi, A., Stellwag, T.B., Venkatensan, S., Lundstrom, M., Emery, K.A.
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Sprache:eng
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Zusammenfassung:A critical assessment of the photovoltaic quality of epitaxial GaAs grown by metal-organic chemical vapor deposition (MOCVD) and by molecular-beam epitaxy (MBE) is reported. Epitaxial films of nominally identical structure were grown by the two techniques and were fabricated into p-n heteroface solar cells. The 0.5-cm by 0.5-cm cells were then characterized and compared. The MOCVD-grown films produced independently verified record efficiency cells of 24.8% under 1-sun AM1.5 global conditions while the MB-grown films produced similarly high efficiencies of 23.8%. The material qualities of the two films in terms of minority-carrier diffusion lengths and surface recombination velocities were quite comparable. These results demonstrate that the quality of MBE-grown films can be quite comparable to the best MOCVD-grown films and that they are suitable for high-efficiency solar cells.< >
ISSN:0018-9383
1557-9646
DOI:10.1109/16.46385