A Dual-Capture Wide Dynamic Range CMOS Image Sensor Using Floating-Diffusion Capacitor
A dual-capture wide dynamic range CMOS image sensor using an in-pixel floating-diffusion (FD) storage capacitor is proposed. The proposed structure uses the FD as a storage capacitor. The potential of the FD node is read out using a floating-gate capacitor without a contact metallization of the FD n...
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Veröffentlicht in: | IEEE transactions on electron devices 2008-10, Vol.55 (10), p.2590-2594 |
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Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | A dual-capture wide dynamic range CMOS image sensor using an in-pixel floating-diffusion (FD) storage capacitor is proposed. The proposed structure uses the FD as a storage capacitor. The potential of the FD node is read out using a floating-gate capacitor without a contact metallization of the FD node to reduce the leakage. The proposed sensor was fabricated using a 0.35-mum CMOS process. The chip includes 320 times 240 pixels whose pitch is 5.6 mum and whose fill factor is 36%. The measurement results show 100-dB dynamic range, and the leakage at the non-metalized FD is reduced to about one-third of that of the conventional FD with the contact metallization. |
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ISSN: | 0018-9383 1557-9646 |
DOI: | 10.1109/TED.2008.2003023 |