Correction to "InP Bipolar ICs: Scaling Roadmaps, Frequency Limits, Manufacturable Technologies" [Feb 08 271-286]
In the above titled paper (ibid., vol. 96, no. 2, pp. 271-286, Feb 08), there are errors. Corrections are presented here.
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| Veröffentlicht in: | Proceedings of the IEEE 2008-04, Vol.96 (4), p.748-748 |
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| container_title | Proceedings of the IEEE |
| container_volume | 96 |
| creator | Rodwell, Mark J. W. Le, Minh Brar, Berinder |
| description | In the above titled paper (ibid., vol. 96, no. 2, pp. 271-286, Feb 08), there are errors. Corrections are presented here. |
| doi_str_mv | 10.1109/JPROC.2008.918954 |
| format | Article |
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| source | IEEE Electronic Library (IEL) |
| subjects | Bandwidth Conductivity Dielectrics Frequency Heterojunction bipolar transistors Indium gallium arsenide Paper technology Pulp manufacturing Semiconductor device doping Semiconductor device manufacture |
| title | Correction to "InP Bipolar ICs: Scaling Roadmaps, Frequency Limits, Manufacturable Technologies" [Feb 08 271-286] |
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