Fabrication of a MEMS-Based Cobra Probe

Fabrication of a MEMS-Based Cobra Probe

This study presents a new type of cobra probe by using MEMS technology for IC testing. The fabrication includes photolithography, electroforming and polishing process. Mechanical properties of the cobra probe are measured and no fracture or deformation is found after applying a force of 3 g for as m...

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Hauptverfasser: Jung-Tang Huang, Hou-Jun Hsu, Pen-Shan Chao, Kuo-Yu Lee, Chan-Shoue Wu, Sheng-Hsiung Shih, Ming-Zhe Lin, Feng-Yue Lee, Zheng-Chang Lan
Format: Tagungsbericht
Sprache:eng
Schlagworte:
Contact resistance
Electrical resistance measurement
Fabrication
Force measurement
Integrated circuit testing
Lithography
Mechanical factors
Mechanical variables measurement
Micromechanical devices
Probes
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Beschreibung
Zusammenfassung:This study presents a new type of cobra probe by using MEMS technology for IC testing. The fabrication includes photolithography, electroforming and polishing process. Mechanical properties of the cobra probe are measured and no fracture or deformation is found after applying a force of 3 g for as many as 20,000 times. Its contact resistance averages nearly 680 mΩ and overdrive is approximately up to 30 μm.
DOI:10.1109/EDSSC.2007.4450249