Formation of InGaN self-assembled quantum dots on GaN by metal-organic chemical vapor deposition with NH3 periodic interruption growth

Self-assembled InGaN QDs on GaN epi-layer were grown by metal-organic chemical vapor deposition. In the growth of InGaN QDs, NH 3 was supplied in cyclic interrupted mode with interval of 3 seconds and 5 seconds. This work enables the fabrication of dense, uniform InGaN QDs, and is potentially applie...

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Hauptverfasser: Seung-Kju Choi, Jae-Min Jang, Sung-Hak Yi, Jung-A Kim, Woo-Gwang Jung
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Jung-A Kim
Woo-Gwang Jung
description Self-assembled InGaN QDs on GaN epi-layer were grown by metal-organic chemical vapor deposition. In the growth of InGaN QDs, NH 3 was supplied in cyclic interrupted mode with interval of 3 seconds and 5 seconds. This work enables the fabrication of dense, uniform InGaN QDs, and is potentially applied to optical materials systems.
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subjects Atom optics
Chemical vapor deposition
Gallium nitride
Light emitting diodes
MOCVD
Nanoscale devices
Nitrogen
Optical materials
Quantum dots
Temperature
title Formation of InGaN self-assembled quantum dots on GaN by metal-organic chemical vapor deposition with NH3 periodic interruption growth
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