Representation and Inhibition of Abnormal Arcing in Plasma Vapor Deposition Filming

This paper introduces representations of abnormal arcing based on equivalent impedance derived function and further proposes an inhibition design grounded on impedance change rate diagnosis in filming process of plasma vapor deposition.

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Bibliographische Detailangaben
Hauptverfasser:	Linggang Kong, Qing'an Jiang, Weizhong Zhang
Format:	Tagungsbericht
Sprache:	eng
Schlagworte:	Chemical vapor deposition Impedance Plasma density Plasma diagnostics Plasma displays Plasma materials processing Plasma properties Plasma sheaths Plasma temperature Voltage
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Beschreibung
Zusammenfassung:	This paper introduces representations of abnormal arcing based on equivalent impedance derived function and further proposes an inhibition design grounded on impedance change rate diagnosis in filming process of plasma vapor deposition.
DOI:	10.1109/INOW.2007.4302982