Mesa-type InGaAs pin PDs with InP-Passivation Structure Monolithically Integrated with Resistors and Capacitors with Large Capacitance
We have successfully fabricated mesa-type InGaAs pin PDs with InP-passivation structure monolithically integrated with resistors and capacitors. As for the PD characteristics, the capacitance of 0.19 pF and the dark current of 0.2 nA at a reverse bias voltage of 5 V are obtained. By using the MIM/MI...
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Format: | Tagungsbericht |
Sprache: | eng |
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Zusammenfassung: | We have successfully fabricated mesa-type InGaAs pin PDs with InP-passivation structure monolithically integrated with resistors and capacitors. As for the PD characteristics, the capacitance of 0.19 pF and the dark current of 0.2 nA at a reverse bias voltage of 5 V are obtained. By using the MIM/MIS stacked structure in the capacitors, a large capacitance of 91 pF is obtained on a chip area of 440 μm 2 . Although the capacitor is very large, it shows a good reliability and the estimated life time is 60 years at a bias voltage of 10 V and an ambient temperature of 125°C. The results promise the cost reduction and miniaturization of modules and systems for fiber optic communications. |
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ISSN: | 1092-8669 |
DOI: | 10.1109/ICIPRM.2007.381129 |