Analytic Extension of the Cell-Based Oxide Breakdown Model to Full Percolation and its Implications

Analytic Extension of the Cell-Based Oxide Breakdown Model to Full Percolation and its Implications

We extend the cell-based approach of Sune to full percolation that is predictive down to 0.4nm. We resolve conflicting reports in the literature on the scaling behavior of the Weibull shape parameter with oxide thickness, and show that Weibull statistics can be violated if pre-existing traps are pre...

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Bibliographische Detailangaben
Hauptverfasser: Krishnan, A.T., Nicollian, P.E.
Format: Tagungsbericht
Sprache:eng
Schlagworte:
Active shape model
Dielectric breakdown
Electric breakdown
GOI
Instruments
oxide reliability
Percolation model
Predictive models
Silicon
Solid modeling
Statistical analysis
Statistical distributions
Statistics
TDDB
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Beschreibung
Zusammenfassung:We extend the cell-based approach of Sune to full percolation that is predictive down to 0.4nm. We resolve conflicting reports in the literature on the scaling behavior of the Weibull shape parameter with oxide thickness, and show that Weibull statistics can be violated if pre-existing traps are present.
ISSN:1541-7026
1938-1891
DOI:10.1109/RELPHY.2007.369897