A new low-emissivity films Prepared by Magnetron Sputtering

Low-emissivity (Low-E) films, which have low transparence in near infrared region, are prepared by RF magnetron reactive sputtering and DC sputtering in turn as the structure of air/TiO2/Ti/Ag/TiO2/ on the glass. Titanium layer protection Ag layer from being oxidized is observed. The transmittance of low-E films was measured by spectrophotometer. The Low-E films can get a best transmittance, while the thickness of titanium layer is about 1 nanometer. In the visible region (380 nm - 780 nm), the highest transmittance is up to 82.4%, and the average transmittance is 75%. In the near infrared region (780 nm - 2500 nm), the average transmittance is 16.2%.