Study of Electric Potential of Dielectric Target Irradiated by Ion-Plasma Flow

In the recent years the use of highly efficient plasma technologies of processing the new materials and coatings attracts essentially growing interest. Most commonly, plasma accelerators with closed electron drift of different modifications are used as the plasma sources in such processes, of those, single-stage plasma accelerators with anode layer. Such devices can be efficiently used for ion treatment of metal and non-metal targets, cleaning, etching and activation of the surface. In cases of ion treatment of non-conductive, dielectric targets the problems occur due to uncompensation of the ion flow by electrons which results in appearance of positive charge at the target and reduces the efficiency of ion treatment. In the present work the results of measurement of floating potential of dielectric target irradiated by the ion-plasma flow from the accelerator are presented in dependence on working gas pressure and discharge parameters