Reducing Charge Injection in Active-Matrix a-Si TFT Pixels

A technique for reducing charge injection in active-matrix amorphous silicon thin film transistor pixels is presented. Using a gate pulse with two falling rates, more than 50% reduction in the induced error voltage was achieved

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Hauptverfasser: Ashtiani, S.J., Nathan, A.
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Nathan, A.
description A technique for reducing charge injection in active-matrix amorphous silicon thin film transistor pixels is presented. Using a gate pulse with two falling rates, more than 50% reduction in the induced error voltage was achieved
doi_str_mv 10.1109/LEOS.2006.279204
format Conference Proceeding
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identifier ISSN: 1092-8081
ispartof LEOS 2006 - 19th Annual Meeting of the IEEE Lasers and Electro-Optics Society, 2006, p.440-441
issn 1092-8081
2766-1733
language eng
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source IEEE Electronic Library (IEL) Conference Proceedings
subjects Active matrix liquid crystal displays
Active matrix organic light emitting diodes
Active matrix technology
Amorphous silicon
Backplanes
Circuits
Liquid crystal displays
Switches
Thin film transistors
Voltage
title Reducing Charge Injection in Active-Matrix a-Si TFT Pixels
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