Self-aligned high-quality total internal reflection mirrors

Self-aligned high-quality total internal reflection mirrors

High-quality total internal reflection (TIR) mirrors are fabricated by a new self-aligned etch process using SiCl/sub 4/ reactive ion etching (RTE). The self-aligned etch process requires only a single SiO/sub 2/ mask layer without additional dielectric depositions and lift-off steps. The reflectivi...

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Veröffentlicht in:IEEE photonics technology letters 1995-08, Vol.7 (8), p.899-901
Hauptverfasser: Han, H., Forbes, D.V., Coleman, J.J.
Format: Artikel
Sprache:eng
Schlagworte:
Dielectrics
Etching
Exact sciences and technology
Fundamental areas of phenomenology (including applications)
Lenses, prisms and mirrors
Mirrors
Optical elements, devices, and systems
Optical reflection
Optical waveguides
Optics
Photonic integrated circuits
Physics
Quantum well lasers
Reflectivity
Semiconductor waveguides
Waveguide lasers
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Beschreibung
Zusammenfassung:High-quality total internal reflection (TIR) mirrors are fabricated by a new self-aligned etch process using SiCl/sub 4/ reactive ion etching (RTE). The self-aligned etch process requires only a single SiO/sub 2/ mask layer without additional dielectric depositions and lift-off steps. The reflectivity of the TIR mirrors are measured by characterizing InGaAs-GaAs-AlGaAs strained-layer quantum-well heterostructure crank lasers that consist of crank-shaped ridge waveguides with two TIR mirrors and two cleaved facets. It is found that the self-aligned TIR mirrors have a very high reflectivity of 0.90 (0.46 dB/90/spl deg/ loss).< >
ISSN:1041-1135
1941-0174
DOI:10.1109/68.404008