Real-time control of reactive ion etching: identification and disturbance rejection

Real-time control of reactive ion etching: identification and disturbance rejection

The main processes involved in the manufacture of integrated circuits are deposition, lithography, etching, and implantation. This paper describes results on identification and real-time control of reactive ion etchers. Experimental results show that significant disturbances to the etch rate can be...

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Bibliographische Detailangaben
Hauptverfasser: Rashap, B.A., Khargonekar, P.P., Grizzle, J.W., Elta, M.E., Freudenberg, J.S., Terry, F.L.
Format: Tagungsbericht
Sprache:eng
Schlagworte:
Etching
Feedback control
Laboratories
Manufacturing processes
Open loop systems
PD control
Pi control
Plasma applications
Pressure control
Weight control
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Beschreibung
Zusammenfassung:The main processes involved in the manufacture of integrated circuits are deposition, lithography, etching, and implantation. This paper describes results on identification and real-time control of reactive ion etchers. Experimental results show that significant disturbances to the etch rate can be attenuated with real-time feedback control.< >
DOI:10.1109/CDC.1993.325839