Novel methods for the reliability testing of ferroelectric DRAM storage capacitors

A new technique has been developed for the characterization of dielectric voltage- and charge-decay times (T/sub V/ and T/sub Q/) in sol-gel derived ferroelectric films under open-circuit conditions. Voltage decay potentially poses a limitation on the maximum allowable refresh-time in the DRAM capac...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: Sudhama, C., Khamankaar, R., Kim, J., Jiang, B., Lee, J.C., Maniar, P.D., Jones, R.E., Mogab, C.J.
Format: Tagungsbericht
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:A new technique has been developed for the characterization of dielectric voltage- and charge-decay times (T/sub V/ and T/sub Q/) in sol-gel derived ferroelectric films under open-circuit conditions. Voltage decay potentially poses a limitation on the maximum allowable refresh-time in the DRAM capacitor. This direct measurement of T/sub V/ is preferred to its conventional estimation based on the current-voltage relationship, because of the implicit inclusion of nonlinearities and stress-induced leakage-reduction effects. Undoped and lanthanum-doped lead-zirconate-titanate (PZT) films have also been characterized for frequency-dispersion in large-signal polarization, bit "0" relaxation and a new bit "1" relaxation mechanism using techniques developed recently. It is proposed that any evaluation of high-permittivity dielectrics for DRAM applications must include these measurements.< >
DOI:10.1109/RELPHY.1994.307831