Analysis of the temperature dependence of hot-carrier-induced degradation in bipolar transistors for Bi-CMOS

The temperature dependence of emitter-base reverse stress degradation in bipolar transistors for Bi-CMOS circuits was studied. A suitable measure of degradation in the operating temperature range was chosen after careful consideration of the fact that bipolar transistor characteristics are very sens...

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Veröffentlicht in:IEEE transactions on electron devices 1994-06, Vol.41 (6), p.978-987
Hauptverfasser: Momose, H.S., Iwai, H.
Format: Artikel
Sprache:eng
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Zusammenfassung:The temperature dependence of emitter-base reverse stress degradation in bipolar transistors for Bi-CMOS circuits was studied. A suitable measure of degradation in the operating temperature range was chosen after careful consideration of the fact that bipolar transistor characteristics are very sensitive to temperature changes. The worst-case temperature conditions within the transistors' operating range were determined. Degradation was found to be worst at around 50/spl deg/C-a result of a tradeoff between thermal recovery from degradation and the effects of bandgap narrowing on bipolar characteristics. The recovery phenomena which had taken place after degradation were also investigated in detail.< >
ISSN:0018-9383
1557-9646
DOI:10.1109/16.293311