Analysis of the temperature dependence of hot-carrier-induced degradation in bipolar transistors for Bi-CMOS
The temperature dependence of emitter-base reverse stress degradation in bipolar transistors for Bi-CMOS circuits was studied. A suitable measure of degradation in the operating temperature range was chosen after careful consideration of the fact that bipolar transistor characteristics are very sens...
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Veröffentlicht in: | IEEE transactions on electron devices 1994-06, Vol.41 (6), p.978-987 |
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Hauptverfasser: | , |
Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | The temperature dependence of emitter-base reverse stress degradation in bipolar transistors for Bi-CMOS circuits was studied. A suitable measure of degradation in the operating temperature range was chosen after careful consideration of the fact that bipolar transistor characteristics are very sensitive to temperature changes. The worst-case temperature conditions within the transistors' operating range were determined. Degradation was found to be worst at around 50/spl deg/C-a result of a tradeoff between thermal recovery from degradation and the effects of bandgap narrowing on bipolar characteristics. The recovery phenomena which had taken place after degradation were also investigated in detail.< > |
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ISSN: | 0018-9383 1557-9646 |
DOI: | 10.1109/16.293311 |