Fabrication of Silicon on Lattice-Engineered Substrate (SOLES) as a Platform for Monolithic Integration of CMOS and Optoelectronic Devices
We report the fabrication of a novel substrate platform for the monolithic integration of Si-based CMOS and GaAs-based optoelectronic devices. This platform, which we refer to as silicon on lattice-engineered substrate (SOLES), consists of a compositionally graded SiGe buffer buried underneath a sil...
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| creator | Dohrman, C.L. Chilukuri, K. Isaacson, D.M. Lee, M.L. Fitzgerald, E.A. |
| description | We report the fabrication of a novel substrate platform for the monolithic integration of Si-based CMOS and GaAs-based optoelectronic devices. This platform, which we refer to as silicon on lattice-engineered substrate (SOLES), consists of a compositionally graded SiGe buffer buried underneath a silicon-on-insulator (SOI) structure, all fabricated on a Si substrate |
| doi_str_mv | 10.1109/ISTDM.2006.246586 |
| format | Conference Proceeding |
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This platform, which we refer to as silicon on lattice-engineered substrate (SOLES), consists of a compositionally graded SiGe buffer buried underneath a silicon-on-insulator (SOI) structure, all fabricated on a Si substrate</description><subject>Germanium silicon alloys</subject><subject>Materials science and technology</subject><subject>Monolithic integrated circuits</subject><subject>Optical device fabrication</subject><subject>Optoelectronic devices</subject><subject>Rough surfaces</subject><subject>Silicon alloys</subject><subject>Silicon germanium</subject><subject>Surface roughness</subject><subject>Wafer bonding</subject><isbn>9781424404612</isbn><isbn>1424404614</isbn><fulltext>true</fulltext><rsrctype>conference_proceeding</rsrctype><creationdate>2006</creationdate><recordtype>conference_proceeding</recordtype><sourceid>6IE</sourceid><sourceid>RIE</sourceid><recordid>eNo9jc1KAzEcxAMiKLUPIF5y1MPWfGdzlLZqYcsK23vJZv9bI9ukZKPgK_jUrijOYWYOw28QuqZkQSkx95tmt9ouGCFqwYSSpTpDc6NLKpgQRCjKLtB8HN_IJG6UZOoSfT3aNnlns48Bxx43fvDupwZc2Zy9g2IdDj4AJOhw896OOdkM-Lapq3Vzh-2ILX4ZbO5jOuLJ8DaGOPj86h3ehAyH9M9ebusG29Dh-pQjDOByimGareBj-hmv0HlvhxHmfzlDu8f1bvlcVPXTZvlQFd6QXKiWO6sFb63QVhnLZEn7rtOGgKPMEWGkVbonGpzpKO0J507qrnW8NNAyw2fo5hfrAWB_Sv5o0-eeaiqNlPwb4ctiRA</recordid><startdate>2006</startdate><enddate>2006</enddate><creator>Dohrman, C.L.</creator><creator>Chilukuri, K.</creator><creator>Isaacson, D.M.</creator><creator>Lee, M.L.</creator><creator>Fitzgerald, E.A.</creator><general>IEEE</general><scope>6IE</scope><scope>6IL</scope><scope>CBEJK</scope><scope>RIE</scope><scope>RIL</scope></search><sort><creationdate>2006</creationdate><title>Fabrication of Silicon on Lattice-Engineered Substrate (SOLES) as a Platform for Monolithic Integration of CMOS and Optoelectronic Devices</title><author>Dohrman, C.L. ; Chilukuri, K. ; Isaacson, D.M. ; Lee, M.L. ; Fitzgerald, E.A.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-i90t-6b3ca743ba47a69a2581fdd790ec12c0495a67f07ec9d11f033c57dbc389eb293</frbrgroupid><rsrctype>conference_proceedings</rsrctype><prefilter>conference_proceedings</prefilter><language>eng</language><creationdate>2006</creationdate><topic>Germanium silicon alloys</topic><topic>Materials science and technology</topic><topic>Monolithic integrated circuits</topic><topic>Optical device fabrication</topic><topic>Optoelectronic devices</topic><topic>Rough surfaces</topic><topic>Silicon alloys</topic><topic>Silicon germanium</topic><topic>Surface roughness</topic><topic>Wafer bonding</topic><toplevel>online_resources</toplevel><creatorcontrib>Dohrman, C.L.</creatorcontrib><creatorcontrib>Chilukuri, K.</creatorcontrib><creatorcontrib>Isaacson, D.M.</creatorcontrib><creatorcontrib>Lee, M.L.</creatorcontrib><creatorcontrib>Fitzgerald, E.A.</creatorcontrib><collection>IEEE Electronic Library (IEL) Conference Proceedings</collection><collection>IEEE Proceedings Order Plan All Online (POP All Online) 1998-present by volume</collection><collection>IEEE Xplore All Conference Proceedings</collection><collection>IEEE Electronic Library (IEL)</collection><collection>IEEE Proceedings Order Plans (POP All) 1998-Present</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Dohrman, C.L.</au><au>Chilukuri, K.</au><au>Isaacson, D.M.</au><au>Lee, M.L.</au><au>Fitzgerald, E.A.</au><format>book</format><genre>proceeding</genre><ristype>CONF</ristype><atitle>Fabrication of Silicon on Lattice-Engineered Substrate (SOLES) as a Platform for Monolithic Integration of CMOS and Optoelectronic Devices</atitle><btitle>2006 International SiGe Technology and Device Meeting</btitle><stitle>ISTDM</stitle><date>2006</date><risdate>2006</risdate><spage>1</spage><epage>2</epage><pages>1-2</pages><isbn>9781424404612</isbn><isbn>1424404614</isbn><abstract>We report the fabrication of a novel substrate platform for the monolithic integration of Si-based CMOS and GaAs-based optoelectronic devices. 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| identifier | ISBN: 9781424404612 |
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| source | IEEE Electronic Library (IEL) Conference Proceedings |
| subjects | Germanium silicon alloys Materials science and technology Monolithic integrated circuits Optical device fabrication Optoelectronic devices Rough surfaces Silicon alloys Silicon germanium Surface roughness Wafer bonding |
| title | Fabrication of Silicon on Lattice-Engineered Substrate (SOLES) as a Platform for Monolithic Integration of CMOS and Optoelectronic Devices |
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