Fabrication of Silicon on Lattice-Engineered Substrate (SOLES) as a Platform for Monolithic Integration of CMOS and Optoelectronic Devices

Fabrication of Silicon on Lattice-Engineered Substrate (SOLES) as a Platform for Monolithic Integration of CMOS and Optoelectronic Devices

We report the fabrication of a novel substrate platform for the monolithic integration of Si-based CMOS and GaAs-based optoelectronic devices. This platform, which we refer to as silicon on lattice-engineered substrate (SOLES), consists of a compositionally graded SiGe buffer buried underneath a sil...

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Hauptverfasser: Dohrman, C.L., Chilukuri, K., Isaacson, D.M., Lee, M.L., Fitzgerald, E.A.
Format: Tagungsbericht
Sprache:eng
Schlagworte:
Germanium silicon alloys
Materials science and technology
Monolithic integrated circuits
Optical device fabrication
Optoelectronic devices
Rough surfaces
Silicon alloys
Silicon germanium
Surface roughness
Wafer bonding
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Zusammenfassung:We report the fabrication of a novel substrate platform for the monolithic integration of Si-based CMOS and GaAs-based optoelectronic devices. This platform, which we refer to as silicon on lattice-engineered substrate (SOLES), consists of a compositionally graded SiGe buffer buried underneath a silicon-on-insulator (SOI) structure, all fabricated on a Si substrate
DOI:10.1109/ISTDM.2006.246586