Analysis of EOS electric field modeling precision

Analysis of EOS electric field modeling precision

Principles of electronic optical system (EOS) modeling using finite element method are presented. Modeling precision dependence on finite element mesh density is investigated. Modeling precision of electric field potential created by EOS is analyzed by calculating electron trajectories and scatterin...

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Bibliographische Detailangaben
Hauptverfasser: Noreika, A., Tarvydas, P., Navikas, D., Cepulis, V.
Format: Tagungsbericht
Sprache:eng
Schlagworte:
Cathode ray tubes
Charge carrier processes
Earth Observing System
Electric potential
Electrodes
Electrons
Engine cylinders
Finite element methods
Mesh generation
Optical scattering
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Beschreibung
Zusammenfassung:Principles of electronic optical system (EOS) modeling using finite element method are presented. Modeling precision dependence on finite element mesh density is investigated. Modeling precision of electric field potential created by EOS is analyzed by calculating electron trajectories and scattering of their traces on the screen
ISSN:1330-1012
DOI:10.1109/ITI.2006.1708542