A high repetition rate multi-pulse discharge power for heating plasma

Summary form only given. In this paper, a high repetition rate and multi-pulse discharge power is reported, which can be used to heating plasma. The discharge width, repetition rate and the number of pulse can be adjusted. This power allows us to give higher mean power and very high peak power in sh...

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Hauptverfasser: Baocai Jiang, Wenzheng Lin
Format: Tagungsbericht
Sprache:eng
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Zusammenfassung:Summary form only given. In this paper, a high repetition rate and multi-pulse discharge power is reported, which can be used to heating plasma. The discharge width, repetition rate and the number of pulse can be adjusted. This power allows us to give higher mean power and very high peak power in short duration with small power supply. In many applications of interest, it will be advantageous to use this multi-pulse circuit. This power consists of several storage capacitors (C1, C2, ..., Cn), switches (S1, S2, ..., Sn), and one high voltage power (H.V). Every capacitor is connected in series with relevant switch respectively and forms many discharge circuits. These circuits are connected in parallel with the same load (plasma). The plasma is pre-ionized by H.V and kept on "simmer" state. The capacitors (C1, C2, ..., Cn) are charged to Vc in advance. After trigger signals are input one by one, the capacitors (C1, C2, ..., Cn) begin to discharge through switches (S1, S2, ..., Sn) sequentially into the plasma. The number of discharge pulse is decided by the number of C and S, and repetition rate equals to the frequency of input signals. The pulse width depends on the parameters of every discharge circuit such as C an d Vc etc. and can be shortened to a few ns
ISSN:0730-9244
2576-7208
DOI:10.1109/PLASMA.2006.1707031