430-V 12.4- hboxmOmegacdot hboxcm^2Normally off 4H-SiC Lateral JFET
This letter reports the experimental demonstration of the first 4H-SiC normally off high-voltage lateral junction field-effect transistor. The design and fabrication of such a device have been investigated. The fabricated device has a vertical channel length of 1.8 mum created by tilted aluminum imp...
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Veröffentlicht in: | IEEE electron device letters 2006-10, Vol.27 (10), p.834-836 |
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Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | This letter reports the experimental demonstration of the first 4H-SiC normally off high-voltage lateral junction field-effect transistor. The design and fabrication of such a device have been investigated. The fabricated device has a vertical channel length of 1.8 mum created by tilted aluminum implantation on the sidewalls of deep trenches and a lateral drift-region length of 5 mum. Normally off operation (V GS =0V) with a blocking voltage V br of 430 V has been achieved with a specific on-resistance R on-sp of 12.4 mOmegamiddotcm 2 , which is the lowest specific on-resistance for 4H-SiC lateral power switches reported to date, resulting in a V br 2 /R on-sp value of 15 MW/cm 2 . This is among the best V br 2 /R on-sp figure-of-merit reported to date for 4H-SiC lateral high-voltage devices |
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ISSN: | 0741-3106 1558-0563 |
DOI: | 10.1109/LED.2006.883057 |