Study of particularities for metal contact formation to the semiconductor high-resistance GaAs:Cr
In the paper, studies of volt-ampere and volt-luxing characteristics of the detector structures based on gallium arsenide, compensated by chromium are carried out. It is shown that metallic contacts to a structure are barrier for electrons. One of contacts is inject at any bias polarity.
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creator | Budnitsky, D.L. Lychagin, A.D. Okaevich, L.S. Tolbanov, O.P. |
description | In the paper, studies of volt-ampere and volt-luxing characteristics of the detector structures based on gallium arsenide, compensated by chromium are carried out. It is shown that metallic contacts to a structure are barrier for electrons. One of contacts is inject at any bias polarity. |
doi_str_mv | 10.1109/SIBCON.2005.1611198 |
format | Conference Proceeding |
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It is shown that metallic contacts to a structure are barrier for electrons. 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It is shown that metallic contacts to a structure are barrier for electrons. One of contacts is inject at any bias polarity.</description><subject>Character generation</subject><subject>Charge carrier processes</subject><subject>Chromium</subject><subject>Communication system control</subject><subject>Contact resistance</subject><subject>Electrons</subject><subject>Gallium arsenide</subject><subject>Ionizing radiation</subject><subject>ohmic contact</subject><subject>Ohmic contacts</subject><subject>Radiation detectors</subject><subject>the detector structure</subject><isbn>0780392191</isbn><isbn>9780780392199</isbn><fulltext>true</fulltext><rsrctype>conference_proceeding</rsrctype><creationdate>2005</creationdate><recordtype>conference_proceeding</recordtype><sourceid>6IE</sourceid><sourceid>RIE</sourceid><recordid>eNp9jrFuwkAQRE-KkEiAL6DZH8C5xQJ86RIrAZqkgB6tjjVeZPvQ3brg7-NI1JnmSfOmGGPmaDNE614P-4_y5ztbWrvKcI2IrngyL3ZT2Nwt0eHYzFK62iG5yzer4tnQQfvzHUIFN4oqvm8oigonqEKElpUa8KFT8vrXtKQSOtAAWjMkbmWQ597rMK7lUi8iJ0lKnWfY0nt6K-PUjCpqEs8enJj51-ex3C2EmU-3KC3F--nxNv_f_gKNekYf</recordid><startdate>2005</startdate><enddate>2005</enddate><creator>Budnitsky, D.L.</creator><creator>Lychagin, A.D.</creator><creator>Okaevich, L.S.</creator><creator>Tolbanov, O.P.</creator><general>IEEE</general><scope>6IE</scope><scope>6IL</scope><scope>CBEJK</scope><scope>RIE</scope><scope>RIL</scope></search><sort><creationdate>2005</creationdate><title>Study of particularities for metal contact formation to the semiconductor high-resistance GaAs:Cr</title><author>Budnitsky, D.L. ; Lychagin, A.D. ; Okaevich, L.S. ; Tolbanov, O.P.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-ieee_primary_16111983</frbrgroupid><rsrctype>conference_proceedings</rsrctype><prefilter>conference_proceedings</prefilter><language>eng</language><creationdate>2005</creationdate><topic>Character generation</topic><topic>Charge carrier processes</topic><topic>Chromium</topic><topic>Communication system control</topic><topic>Contact resistance</topic><topic>Electrons</topic><topic>Gallium arsenide</topic><topic>Ionizing radiation</topic><topic>ohmic contact</topic><topic>Ohmic contacts</topic><topic>Radiation detectors</topic><topic>the detector structure</topic><toplevel>online_resources</toplevel><creatorcontrib>Budnitsky, D.L.</creatorcontrib><creatorcontrib>Lychagin, A.D.</creatorcontrib><creatorcontrib>Okaevich, L.S.</creatorcontrib><creatorcontrib>Tolbanov, O.P.</creatorcontrib><collection>IEEE Electronic Library (IEL) Conference Proceedings</collection><collection>IEEE Proceedings Order Plan All Online (POP All Online) 1998-present by volume</collection><collection>IEEE Xplore All Conference Proceedings</collection><collection>IEEE Electronic Library (IEL)</collection><collection>IEEE Proceedings Order Plans (POP All) 1998-Present</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Budnitsky, D.L.</au><au>Lychagin, A.D.</au><au>Okaevich, L.S.</au><au>Tolbanov, O.P.</au><format>book</format><genre>proceeding</genre><ristype>CONF</ristype><atitle>Study of particularities for metal contact formation to the semiconductor high-resistance GaAs:Cr</atitle><btitle>2005 Siberian Conference on Control and Communications</btitle><stitle>SIBCON</stitle><date>2005</date><risdate>2005</risdate><spage>85</spage><epage>89</epage><pages>85-89</pages><isbn>0780392191</isbn><isbn>9780780392199</isbn><abstract>In the paper, studies of volt-ampere and volt-luxing characteristics of the detector structures based on gallium arsenide, compensated by chromium are carried out. It is shown that metallic contacts to a structure are barrier for electrons. One of contacts is inject at any bias polarity.</abstract><pub>IEEE</pub><doi>10.1109/SIBCON.2005.1611198</doi></addata></record> |
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identifier | ISBN: 0780392191 |
ispartof | 2005 Siberian Conference on Control and Communications, 2005, p.85-89 |
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language | eng |
recordid | cdi_ieee_primary_1611198 |
source | IEEE Electronic Library (IEL) Conference Proceedings |
subjects | Character generation Charge carrier processes Chromium Communication system control Contact resistance Electrons Gallium arsenide Ionizing radiation ohmic contact Ohmic contacts Radiation detectors the detector structure |
title | Study of particularities for metal contact formation to the semiconductor high-resistance GaAs:Cr |
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