Mapping the optical properties of SOI-type photonic crystal waveguides
In this article, we report on systematic mapping of the transmission properties of W1 waveguides as a function of the hole radius, slab thickness, and crystal length. Silicon-on-insulator (SOI) 200 mm diameter unibond wafers were patterned with electron beam lithography and processed on a 200 mm CMO...
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creator | Dulkeith, E. McNab, S.J. Vlasov, Yu.A. |
description | In this article, we report on systematic mapping of the transmission properties of W1 waveguides as a function of the hole radius, slab thickness, and crystal length. Silicon-on-insulator (SOI) 200 mm diameter unibond wafers were patterned with electron beam lithography and processed on a 200 mm CMOS fabrication line. A periodic array of holes was etched through the slab. The waveguide was defined by omitting one row of holes from the photonic crystal lattice |
doi_str_mv | 10.1109/CLEOE.2005.1568366 |
format | Conference Proceeding |
fullrecord | <record><control><sourceid>ieee_6IE</sourceid><recordid>TN_cdi_ieee_primary_1568366</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><ieee_id>1568366</ieee_id><sourcerecordid>1568366</sourcerecordid><originalsourceid>FETCH-ieee_primary_15683663</originalsourceid><addsrcrecordid>eNp9jkELgjAcxQcRFOUXqMu-gLa1nO4sSkHhoe4y7K8uzI1tFX77PHTu8eB3eL_DQ2hDSUQpEbvsnJd5tCckjmjMU8b5DAUiSclUlorkkC5Q4NyDTGEiZlwsUXGRxqihxb4DrI1XteyxsdqA9Qoc1g2-lqfQjwaw6bTXg6pxbUfnJ-8j39C-1B3cGs0b2TsIflyhbZHfsmOoAKAyVj2lHavfK_Z__QIeLzxp</addsrcrecordid><sourcetype>Publisher</sourcetype><iscdi>true</iscdi><recordtype>conference_proceeding</recordtype></control><display><type>conference_proceeding</type><title>Mapping the optical properties of SOI-type photonic crystal waveguides</title><source>IEEE Electronic Library (IEL) Conference Proceedings</source><creator>Dulkeith, E. ; McNab, S.J. ; Vlasov, Yu.A.</creator><creatorcontrib>Dulkeith, E. ; McNab, S.J. ; Vlasov, Yu.A.</creatorcontrib><description>In this article, we report on systematic mapping of the transmission properties of W1 waveguides as a function of the hole radius, slab thickness, and crystal length. Silicon-on-insulator (SOI) 200 mm diameter unibond wafers were patterned with electron beam lithography and processed on a 200 mm CMOS fabrication line. A periodic array of holes was etched through the slab. The waveguide was defined by omitting one row of holes from the photonic crystal lattice</description><identifier>ISBN: 9780780389748</identifier><identifier>ISBN: 0780389743</identifier><identifier>DOI: 10.1109/CLEOE.2005.1568366</identifier><language>eng</language><publisher>IEEE</publisher><subject>CMOS process ; Electron beams ; Electron optics ; Etching ; Fabrication ; Lithography ; Optical waveguides ; Photonic crystals ; Silicon on insulator technology ; Slabs</subject><ispartof>CLEO/Europe. 2005 Conference on Lasers and Electro-Optics Europe, 2005, 2005, p.590-590</ispartof><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://ieeexplore.ieee.org/document/1568366$$EHTML$$P50$$Gieee$$H</linktohtml><link.rule.ids>309,310,776,780,785,786,2052,4036,4037,27902,54895</link.rule.ids><linktorsrc>$$Uhttps://ieeexplore.ieee.org/document/1568366$$EView_record_in_IEEE$$FView_record_in_$$GIEEE</linktorsrc></links><search><creatorcontrib>Dulkeith, E.</creatorcontrib><creatorcontrib>McNab, S.J.</creatorcontrib><creatorcontrib>Vlasov, Yu.A.</creatorcontrib><title>Mapping the optical properties of SOI-type photonic crystal waveguides</title><title>CLEO/Europe. 2005 Conference on Lasers and Electro-Optics Europe, 2005</title><addtitle>CLEOE</addtitle><description>In this article, we report on systematic mapping of the transmission properties of W1 waveguides as a function of the hole radius, slab thickness, and crystal length. Silicon-on-insulator (SOI) 200 mm diameter unibond wafers were patterned with electron beam lithography and processed on a 200 mm CMOS fabrication line. A periodic array of holes was etched through the slab. The waveguide was defined by omitting one row of holes from the photonic crystal lattice</description><subject>CMOS process</subject><subject>Electron beams</subject><subject>Electron optics</subject><subject>Etching</subject><subject>Fabrication</subject><subject>Lithography</subject><subject>Optical waveguides</subject><subject>Photonic crystals</subject><subject>Silicon on insulator technology</subject><subject>Slabs</subject><isbn>9780780389748</isbn><isbn>0780389743</isbn><fulltext>true</fulltext><rsrctype>conference_proceeding</rsrctype><creationdate>2005</creationdate><recordtype>conference_proceeding</recordtype><sourceid>6IE</sourceid><sourceid>RIE</sourceid><recordid>eNp9jkELgjAcxQcRFOUXqMu-gLa1nO4sSkHhoe4y7K8uzI1tFX77PHTu8eB3eL_DQ2hDSUQpEbvsnJd5tCckjmjMU8b5DAUiSclUlorkkC5Q4NyDTGEiZlwsUXGRxqihxb4DrI1XteyxsdqA9Qoc1g2-lqfQjwaw6bTXg6pxbUfnJ-8j39C-1B3cGs0b2TsIflyhbZHfsmOoAKAyVj2lHavfK_Z__QIeLzxp</recordid><startdate>2005</startdate><enddate>2005</enddate><creator>Dulkeith, E.</creator><creator>McNab, S.J.</creator><creator>Vlasov, Yu.A.</creator><general>IEEE</general><scope>6IE</scope><scope>6IL</scope><scope>CBEJK</scope><scope>RIE</scope><scope>RIL</scope></search><sort><creationdate>2005</creationdate><title>Mapping the optical properties of SOI-type photonic crystal waveguides</title><author>Dulkeith, E. ; McNab, S.J. ; Vlasov, Yu.A.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-ieee_primary_15683663</frbrgroupid><rsrctype>conference_proceedings</rsrctype><prefilter>conference_proceedings</prefilter><language>eng</language><creationdate>2005</creationdate><topic>CMOS process</topic><topic>Electron beams</topic><topic>Electron optics</topic><topic>Etching</topic><topic>Fabrication</topic><topic>Lithography</topic><topic>Optical waveguides</topic><topic>Photonic crystals</topic><topic>Silicon on insulator technology</topic><topic>Slabs</topic><toplevel>online_resources</toplevel><creatorcontrib>Dulkeith, E.</creatorcontrib><creatorcontrib>McNab, S.J.</creatorcontrib><creatorcontrib>Vlasov, Yu.A.</creatorcontrib><collection>IEEE Electronic Library (IEL) Conference Proceedings</collection><collection>IEEE Proceedings Order Plan All Online (POP All Online) 1998-present by volume</collection><collection>IEEE Xplore All Conference Proceedings</collection><collection>IEEE Electronic Library (IEL)</collection><collection>IEEE Proceedings Order Plans (POP All) 1998-Present</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Dulkeith, E.</au><au>McNab, S.J.</au><au>Vlasov, Yu.A.</au><format>book</format><genre>proceeding</genre><ristype>CONF</ristype><atitle>Mapping the optical properties of SOI-type photonic crystal waveguides</atitle><btitle>CLEO/Europe. 2005 Conference on Lasers and Electro-Optics Europe, 2005</btitle><stitle>CLEOE</stitle><date>2005</date><risdate>2005</risdate><spage>590</spage><epage>590</epage><pages>590-590</pages><isbn>9780780389748</isbn><isbn>0780389743</isbn><abstract>In this article, we report on systematic mapping of the transmission properties of W1 waveguides as a function of the hole radius, slab thickness, and crystal length. Silicon-on-insulator (SOI) 200 mm diameter unibond wafers were patterned with electron beam lithography and processed on a 200 mm CMOS fabrication line. A periodic array of holes was etched through the slab. The waveguide was defined by omitting one row of holes from the photonic crystal lattice</abstract><pub>IEEE</pub><doi>10.1109/CLEOE.2005.1568366</doi></addata></record> |
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language | eng |
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source | IEEE Electronic Library (IEL) Conference Proceedings |
subjects | CMOS process Electron beams Electron optics Etching Fabrication Lithography Optical waveguides Photonic crystals Silicon on insulator technology Slabs |
title | Mapping the optical properties of SOI-type photonic crystal waveguides |
url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-29T20%3A12%3A50IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-ieee_6IE&rft_val_fmt=info:ofi/fmt:kev:mtx:book&rft.genre=proceeding&rft.atitle=Mapping%20the%20optical%20properties%20of%20SOI-type%20photonic%20crystal%20waveguides&rft.btitle=CLEO/Europe.%202005%20Conference%20on%20Lasers%20and%20Electro-Optics%20Europe,%202005&rft.au=Dulkeith,%20E.&rft.date=2005&rft.spage=590&rft.epage=590&rft.pages=590-590&rft.isbn=9780780389748&rft.isbn_list=0780389743&rft_id=info:doi/10.1109/CLEOE.2005.1568366&rft_dat=%3Cieee_6IE%3E1568366%3C/ieee_6IE%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rft_ieee_id=1568366&rfr_iscdi=true |