An overview of twin-flash technology

The twin-flash cell technology relies on the charge trapping storage concept. The concept is described. The fabrication of the technology nodes ranges from 170 nm to 90 nm. The realization of the concept in different cell types is described. The shrink path beyond the 40 nm node is shown and discuss...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Stein, E.G., Kusters, K.-H., Kamienski, V., Isler, M., Mikolajick, T., Ludwig, C., Schulze, N., Nagel, N., Riedel, S., Willer, J.
Format:	Tagungsbericht
Sprache:	eng
Schlagworte:	Channel hot electron injection Charge carrier processes Costs Digital cameras Electron traps Fabrication Hot carriers Programming profession Smart phones Voltage
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