An overview of twin-flash technology

An overview of twin-flash technology

The twin-flash cell technology relies on the charge trapping storage concept. The concept is described. The fabrication of the technology nodes ranges from 170 nm to 90 nm. The realization of the concept in different cell types is described. The shrink path beyond the 40 nm node is shown and discuss...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: Stein, E.G., Kusters, K.-H., Kamienski, V., Isler, M., Mikolajick, T., Ludwig, C., Schulze, N., Nagel, N., Riedel, S., Willer, J.
Format: Tagungsbericht
Sprache:eng
Schlagworte:
Channel hot electron injection
Charge carrier processes
Costs
Digital cameras
Electron traps
Fabrication
Hot carriers
Programming profession
Smart phones
Voltage
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Beschreibung
Zusammenfassung:The twin-flash cell technology relies on the charge trapping storage concept. The concept is described. The fabrication of the technology nodes ranges from 170 nm to 90 nm. The realization of the concept in different cell types is described. The shrink path beyond the 40 nm node is shown and discussed
DOI:10.1109/NVMT.2005.1541378