Systematic method to optimize conditioning process through real time plasma monitoring

A systematic method to optimize conditioning processes is introduced. By using the plasma monitoring tools such as self-excited electron resonance spectroscopy (SEERS) and optical emission spectroscopy (OES), chamber conditions are analyzed in real time and a conditioning process appropriate to each...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Kye Hyun Baek, Yong Jin Kim, Gyung Jin Min, Chang Jin Kang, Han Ku Cho, Joo Tae Moon
Format:	Tagungsbericht
Sprache:	eng
Schlagworte:	Cleaning Condition monitoring Electrons Optimization methods Plasma applications Plasma measurements Plasma properties Real time systems Semiconductor device modeling Spectroscopy
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