Systematic method to optimize conditioning process through real time plasma monitoring

Systematic method to optimize conditioning process through real time plasma monitoring

A systematic method to optimize conditioning processes is introduced. By using the plasma monitoring tools such as self-excited electron resonance spectroscopy (SEERS) and optical emission spectroscopy (OES), chamber conditions are analyzed in real time and a conditioning process appropriate to each...

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Bibliographische Detailangaben
Hauptverfasser: Kye Hyun Baek, Yong Jin Kim, Gyung Jin Min, Chang Jin Kang, Han Ku Cho, Joo Tae Moon
Format: Tagungsbericht
Sprache:eng
Schlagworte:
Cleaning
Condition monitoring
Electrons
Optimization methods
Plasma applications
Plasma measurements
Plasma properties
Real time systems
Semiconductor device modeling
Spectroscopy
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Beschreibung
Zusammenfassung:A systematic method to optimize conditioning processes is introduced. By using the plasma monitoring tools such as self-excited electron resonance spectroscopy (SEERS) and optical emission spectroscopy (OES), chamber conditions are analyzed in real time and a conditioning process appropriate to each chamber condition is determined quickly. Through this real time analysis and rapid action, total time to optimize the conditioning process is significantly reduced
ISSN:1523-553X
DOI:10.1109/ISSM.2005.1513315