Systematic method to optimize conditioning process through real time plasma monitoring
A systematic method to optimize conditioning processes is introduced. By using the plasma monitoring tools such as self-excited electron resonance spectroscopy (SEERS) and optical emission spectroscopy (OES), chamber conditions are analyzed in real time and a conditioning process appropriate to each...
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| creator | Kye Hyun Baek Yong Jin Kim Gyung Jin Min Chang Jin Kang Han Ku Cho Joo Tae Moon |
| description | A systematic method to optimize conditioning processes is introduced. By using the plasma monitoring tools such as self-excited electron resonance spectroscopy (SEERS) and optical emission spectroscopy (OES), chamber conditions are analyzed in real time and a conditioning process appropriate to each chamber condition is determined quickly. Through this real time analysis and rapid action, total time to optimize the conditioning process is significantly reduced |
| doi_str_mv | 10.1109/ISSM.2005.1513315 |
| format | Conference Proceeding |
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By using the plasma monitoring tools such as self-excited electron resonance spectroscopy (SEERS) and optical emission spectroscopy (OES), chamber conditions are analyzed in real time and a conditioning process appropriate to each chamber condition is determined quickly. Through this real time analysis and rapid action, total time to optimize the conditioning process is significantly reduced</abstract><pub>IEEE</pub><doi>10.1109/ISSM.2005.1513315</doi><tpages>3</tpages></addata></record> |
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| ispartof | ISSM 2005, IEEE International Symposium on Semiconductor Manufacturing, 2005, 2005, p.129-131 |
| issn | 1523-553X |
| language | eng |
| recordid | cdi_ieee_primary_1513315 |
| source | IEEE Electronic Library (IEL) Conference Proceedings |
| subjects | Cleaning Condition monitoring Electrons Optimization methods Plasma applications Plasma measurements Plasma properties Real time systems Semiconductor device modeling Spectroscopy |
| title | Systematic method to optimize conditioning process through real time plasma monitoring |
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