ZrO2 Gate Dielectrics Prepared by E-beam Deposition of Zr and YSZ Films and Post Annealing Processes
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creator | Johansson, M. Yousif, M.Y.A. Sareen, A. Lundgren, P. Bengtsson, S. Sodervall, U. |
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doi_str_mv | 10.1109/ESSDERC.2002.194957 |
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source | IEEE Electronic Library (IEL) Conference Proceedings |
subjects | Annealing Applied sciences Compound structure devices Dielectrics Electronics Exact sciences and technology Materials Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices Zirconium |
title | ZrO2 Gate Dielectrics Prepared by E-beam Deposition of Zr and YSZ Films and Post Annealing Processes |
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