Design and fabrication of micro carbon nanotube column for electron-beam lithography
This articles describes the preliminary design and fabrication results of micro carbon-nano-tube (CNT) column for electron-beam lithography. The column consists of gated single vertical aligned CNT electron source and one metal electrostatic lens. The CNT electron source was fabricated by combinatio...
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| creator | Yao, B.C. Wang, C.P. Tseng, S.C. Tsai, C.H. |
| description | This articles describes the preliminary design and fabrication results of micro carbon-nano-tube (CNT) column for electron-beam lithography. The column consists of gated single vertical aligned CNT electron source and one metal electrostatic lens. The CNT electron source was fabricated by combination of optical lithography, electron-beam writing and inductively coupled plasma chemical vapor deposition (ICP-CVD) growth. The simulated minimum spot size was 80 nm with one metal electrostatic lens for a 40 nm diameter CNT. |
| doi_str_mv | 10.1109/NANO.2005.1500847 |
| format | Conference Proceeding |
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The column consists of gated single vertical aligned CNT electron source and one metal electrostatic lens. The CNT electron source was fabricated by combination of optical lithography, electron-beam writing and inductively coupled plasma chemical vapor deposition (ICP-CVD) growth. 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The column consists of gated single vertical aligned CNT electron source and one metal electrostatic lens. The CNT electron source was fabricated by combination of optical lithography, electron-beam writing and inductively coupled plasma chemical vapor deposition (ICP-CVD) growth. The simulated minimum spot size was 80 nm with one metal electrostatic lens for a 40 nm diameter CNT.</description><subject>Carbon nanotubes</subject><subject>Electron optics</subject><subject>Electron sources</subject><subject>Electrostatics</subject><subject>Lenses</subject><subject>Lithography</subject><subject>Optical coupling</subject><subject>Optical device fabrication</subject><subject>Plasma chemistry</subject><subject>Writing</subject><issn>1944-9399</issn><issn>1944-9380</issn><isbn>0780391993</isbn><isbn>9780780391994</isbn><fulltext>true</fulltext><rsrctype>conference_proceeding</rsrctype><creationdate>2005</creationdate><recordtype>conference_proceeding</recordtype><sourceid>6IE</sourceid><sourceid>RIE</sourceid><recordid>eNo9kMtqAjEYhUMvUGt9gNJNXmDs_08mt6XYK4hu3EuSSTRlJpHMuPDtK1R6NoePA9_iEPKMMEcE_bperDfzGoDPkQOoRt6QCeqmqTRTcEseQSpgGrVmd_-D1g9kNgw_cAnTXAickO2bH-I-UZNaGowt0Zkx5kRzoH10JVNnir1wMimPJ-upy92pTzTkQn3n3Vhyqqw3Pe3ieMj7Yo6H8xO5D6Yb_OzaU7L9eN8uv6rV5vN7uVhVUcNYScZq0BCAyyBbVEJ6x4PCUAvbgmubIEwjLVe-DTYYRCZBC1mjQAW14mxKXv600Xu_O5bYm3LeXf9gv98KUiw</recordid><startdate>2005</startdate><enddate>2005</enddate><creator>Yao, B.C.</creator><creator>Wang, C.P.</creator><creator>Tseng, S.C.</creator><creator>Tsai, C.H.</creator><general>IEEE</general><scope>6IE</scope><scope>6IH</scope><scope>CBEJK</scope><scope>RIE</scope><scope>RIO</scope></search><sort><creationdate>2005</creationdate><title>Design and fabrication of micro carbon nanotube column for electron-beam lithography</title><author>Yao, B.C. ; Wang, C.P. ; Tseng, S.C. ; Tsai, C.H.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-i90t-7332090f057f7d1867ec5f81f26bd0cd4f6a47b58edfbfa113709672161802853</frbrgroupid><rsrctype>conference_proceedings</rsrctype><prefilter>conference_proceedings</prefilter><language>eng</language><creationdate>2005</creationdate><topic>Carbon nanotubes</topic><topic>Electron optics</topic><topic>Electron sources</topic><topic>Electrostatics</topic><topic>Lenses</topic><topic>Lithography</topic><topic>Optical coupling</topic><topic>Optical device fabrication</topic><topic>Plasma chemistry</topic><topic>Writing</topic><toplevel>online_resources</toplevel><creatorcontrib>Yao, B.C.</creatorcontrib><creatorcontrib>Wang, C.P.</creatorcontrib><creatorcontrib>Tseng, S.C.</creatorcontrib><creatorcontrib>Tsai, C.H.</creatorcontrib><collection>IEEE Electronic Library (IEL) Conference Proceedings</collection><collection>IEEE Proceedings Order Plan (POP) 1998-present by volume</collection><collection>IEEE Xplore All Conference Proceedings</collection><collection>IEEE Electronic Library (IEL)</collection><collection>IEEE Proceedings Order Plans (POP) 1998-present</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Yao, B.C.</au><au>Wang, C.P.</au><au>Tseng, S.C.</au><au>Tsai, C.H.</au><format>book</format><genre>proceeding</genre><ristype>CONF</ristype><atitle>Design and fabrication of micro carbon nanotube column for electron-beam lithography</atitle><btitle>5th IEEE Conference on Nanotechnology, 2005</btitle><stitle>NANO</stitle><date>2005</date><risdate>2005</risdate><spage>673</spage><epage>676 vol. 2</epage><pages>673-676 vol. 2</pages><issn>1944-9399</issn><eissn>1944-9380</eissn><isbn>0780391993</isbn><isbn>9780780391994</isbn><abstract>This articles describes the preliminary design and fabrication results of micro carbon-nano-tube (CNT) column for electron-beam lithography. The column consists of gated single vertical aligned CNT electron source and one metal electrostatic lens. The CNT electron source was fabricated by combination of optical lithography, electron-beam writing and inductively coupled plasma chemical vapor deposition (ICP-CVD) growth. The simulated minimum spot size was 80 nm with one metal electrostatic lens for a 40 nm diameter CNT.</abstract><pub>IEEE</pub><doi>10.1109/NANO.2005.1500847</doi></addata></record> |
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| subjects | Carbon nanotubes Electron optics Electron sources Electrostatics Lenses Lithography Optical coupling Optical device fabrication Plasma chemistry Writing |
| title | Design and fabrication of micro carbon nanotube column for electron-beam lithography |
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