Design and fabrication of micro carbon nanotube column for electron-beam lithography

Design and fabrication of micro carbon nanotube column for electron-beam lithography

This articles describes the preliminary design and fabrication results of micro carbon-nano-tube (CNT) column for electron-beam lithography. The column consists of gated single vertical aligned CNT electron source and one metal electrostatic lens. The CNT electron source was fabricated by combinatio...

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Hauptverfasser: Yao, B.C., Wang, C.P., Tseng, S.C., Tsai, C.H.
Format: Tagungsbericht
Sprache:eng
Schlagworte:
Carbon nanotubes
Electron optics
Electron sources
Electrostatics
Lenses
Lithography
Optical coupling
Optical device fabrication
Plasma chemistry
Writing
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Beschreibung
Zusammenfassung:This articles describes the preliminary design and fabrication results of micro carbon-nano-tube (CNT) column for electron-beam lithography. The column consists of gated single vertical aligned CNT electron source and one metal electrostatic lens. The CNT electron source was fabricated by combination of optical lithography, electron-beam writing and inductively coupled plasma chemical vapor deposition (ICP-CVD) growth. The simulated minimum spot size was 80 nm with one metal electrostatic lens for a 40 nm diameter CNT.
ISSN:1944-9399
1944-9380
DOI:10.1109/NANO.2005.1500847