High mobility solution-deposited chalcogenide films for flexible applications

The fabrication of solution-processed thin-film transistors (TFTs), which yield field-effect mobilities >10 cm/sup 2//V-sec, is a key challenge for the production of high-performance flexible electronics. This talk addresses a hydrazinium precursor approach for solution-processing metal chalcogen...

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Hauptverfasser: Mitzi, D.B., Milliron, D.J., Copel, M., Murray, C., Kosbar, L.
Format: Tagungsbericht
Sprache:eng
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Beschreibung
Zusammenfassung:The fabrication of solution-processed thin-film transistors (TFTs), which yield field-effect mobilities >10 cm/sup 2//V-sec, is a key challenge for the production of high-performance flexible electronics. This talk addresses a hydrazinium precursor approach for solution-processing metal chalcogenide films. Ultrathin n-type SnSe/sub 2-x/S/sub x/, In/sub 2/Se/sub 3/ and p-type CuInSe/sub 2-x/S/sub x/ TFT channels have been deposited by spin coating from hydrazine- and nonhydrazine-based solutions, yielding saturation regime field-effect mobilities and on-off ratios as high as 16 cm/sup 2//V-s and 10/sup 6/, respectively. The new deposition technique is expected to be extendable to a wider range of metal chalcogenides, offering opportunities for TFTs as well as other thin-film devices, including solar cells, memory and thermoelectric devices.
ISSN:1524-766X
2690-8174
DOI:10.1109/VTSA.2005.1497075