High mobility solution-deposited chalcogenide films for flexible applications
The fabrication of solution-processed thin-film transistors (TFTs), which yield field-effect mobilities >10 cm/sup 2//V-sec, is a key challenge for the production of high-performance flexible electronics. This talk addresses a hydrazinium precursor approach for solution-processing metal chalcogen...
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Format: | Tagungsbericht |
Sprache: | eng |
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Zusammenfassung: | The fabrication of solution-processed thin-film transistors (TFTs), which yield field-effect mobilities >10 cm/sup 2//V-sec, is a key challenge for the production of high-performance flexible electronics. This talk addresses a hydrazinium precursor approach for solution-processing metal chalcogenide films. Ultrathin n-type SnSe/sub 2-x/S/sub x/, In/sub 2/Se/sub 3/ and p-type CuInSe/sub 2-x/S/sub x/ TFT channels have been deposited by spin coating from hydrazine- and nonhydrazine-based solutions, yielding saturation regime field-effect mobilities and on-off ratios as high as 16 cm/sup 2//V-s and 10/sup 6/, respectively. The new deposition technique is expected to be extendable to a wider range of metal chalcogenides, offering opportunities for TFTs as well as other thin-film devices, including solar cells, memory and thermoelectric devices. |
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ISSN: | 1524-766X 2690-8174 |
DOI: | 10.1109/VTSA.2005.1497075 |