Rapid mapping of AR coating thickness on Si solar cells using GT-FabScan 6000
A new technique for rapid mapping of the thickness, of an antireflection (AR) coating on a solar cell is described. A filtered, reflectance (intensity) image of the AR-coated wafer is generated by a CCD camera mounted on a GTFabScan. This image is converted into a thickness image using a transformat...
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creator | Sopori, B. Amieva, J. Butterfield, B. Chuan Li |
description | A new technique for rapid mapping of the thickness, of an antireflection (AR) coating on a solar cell is described. A filtered, reflectance (intensity) image of the AR-coated wafer is generated by a CCD camera mounted on a GTFabScan. This image is converted into a thickness image using a transformation relating local AR thickness to the local intensity in the image plane. The thickness map is generated in |
doi_str_mv | 10.1109/PVSC.2005.1488287 |
format | Conference Proceeding |
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A filtered, reflectance (intensity) image of the AR-coated wafer is generated by a CCD camera mounted on a GTFabScan. This image is converted into a thickness image using a transformation relating local AR thickness to the local intensity in the image plane. The thickness map is generated in <100 ms.</description><identifier>ISSN: 0160-8371</identifier><identifier>ISBN: 9780780387072</identifier><identifier>ISBN: 0780387074</identifier><identifier>DOI: 10.1109/PVSC.2005.1488287</identifier><language>eng</language><publisher>United States: IEEE</publisher><subject>ANTIREFLECTION (AR) COATING ; CAMERAS ; COATINGS ; Hydrogen ; MATERIALS SCIENCE ; Metallization ; Optical films ; Passivation ; PHOTOCURRENT ; Photovoltaic cells ; PV ; REFLECTANCE (INTENSITY) IMAGE ; Reflectivity ; Refractive index ; SOLAR CELLS ; SOLAR ENERGY ; SOLAR ENERGY - PHOTOVOLTAICS ; Solar power generation ; THICKNESS ; Thickness measurement ; TRANSFORMATIONS</subject><ispartof>Conference Record of the Thirty-first IEEE Photovoltaic Specialists Conference, 2005, 2005, p.943-946</ispartof><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://ieeexplore.ieee.org/document/1488287$$EHTML$$P50$$Gieee$$H</linktohtml><link.rule.ids>230,309,310,780,784,789,790,885,2056,27924,54919</link.rule.ids><linktorsrc>$$Uhttps://ieeexplore.ieee.org/document/1488287$$EView_record_in_IEEE$$FView_record_in_$$GIEEE</linktorsrc><backlink>$$Uhttps://www.osti.gov/servlets/purl/15016489$$D View this record in Osti.gov$$Hfree_for_read</backlink></links><search><creatorcontrib>Sopori, B.</creatorcontrib><creatorcontrib>Amieva, J.</creatorcontrib><creatorcontrib>Butterfield, B.</creatorcontrib><creatorcontrib>Chuan Li</creatorcontrib><creatorcontrib>National Renewable Energy Lab., Golden, CO (US)</creatorcontrib><title>Rapid mapping of AR coating thickness on Si solar cells using GT-FabScan 6000</title><title>Conference Record of the Thirty-first IEEE Photovoltaic Specialists Conference, 2005</title><addtitle>PVSC</addtitle><description>A new technique for rapid mapping of the thickness, of an antireflection (AR) coating on a solar cell is described. A filtered, reflectance (intensity) image of the AR-coated wafer is generated by a CCD camera mounted on a GTFabScan. This image is converted into a thickness image using a transformation relating local AR thickness to the local intensity in the image plane. The thickness map is generated in <100 ms.</description><subject>ANTIREFLECTION (AR) COATING</subject><subject>CAMERAS</subject><subject>COATINGS</subject><subject>Hydrogen</subject><subject>MATERIALS SCIENCE</subject><subject>Metallization</subject><subject>Optical films</subject><subject>Passivation</subject><subject>PHOTOCURRENT</subject><subject>Photovoltaic cells</subject><subject>PV</subject><subject>REFLECTANCE (INTENSITY) IMAGE</subject><subject>Reflectivity</subject><subject>Refractive index</subject><subject>SOLAR CELLS</subject><subject>SOLAR ENERGY</subject><subject>SOLAR ENERGY - PHOTOVOLTAICS</subject><subject>Solar power generation</subject><subject>THICKNESS</subject><subject>Thickness measurement</subject><subject>TRANSFORMATIONS</subject><issn>0160-8371</issn><isbn>9780780387072</isbn><isbn>0780387074</isbn><fulltext>true</fulltext><rsrctype>conference_proceeding</rsrctype><creationdate>2005</creationdate><recordtype>conference_proceeding</recordtype><sourceid>6IE</sourceid><sourceid>RIE</sourceid><recordid>eNotkFtLw0AQhRdUsNT-APFlwefEvWRvj6XYVqgoTfU1bCYTu5omoRsf_PemtGcGDgMfB-YQcs9ZyjlzT--f-SIVjKmUZ9YKa67IzBnLxpXWMCOuyYRxzRIrDb8lsxi_2ahMSePUhLxufR8qevB9H9ov2tV0vqXQ-eF0DfsAPy3GSLuW5oHGrvFHCtg0kf7GE7HaJUtf5uBbqsfUO3JT-ybi7OJT8rF83i3WyeZt9bKYb5IguRgSpbhFgDIzOnPGlaCsZUJJRMVqoTU3SuM4wpm6yiR6KKHUpa-4E5V0Wk7J4zm3i0MoIoQBYQ9d2yIMBVfjv5l1I_VwpgIiFv0xHPzxr7jUJP8BFbpYjQ</recordid><startdate>20050101</startdate><enddate>20050101</enddate><creator>Sopori, B.</creator><creator>Amieva, J.</creator><creator>Butterfield, B.</creator><creator>Chuan Li</creator><general>IEEE</general><scope>6IE</scope><scope>6IH</scope><scope>CBEJK</scope><scope>RIE</scope><scope>RIO</scope><scope>OIOZB</scope><scope>OTOTI</scope></search><sort><creationdate>20050101</creationdate><title>Rapid mapping of AR coating thickness on Si solar cells using GT-FabScan 6000</title><author>Sopori, B. ; Amieva, J. ; Butterfield, B. ; Chuan Li</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-i312t-5518eccb4764979bc5880253ee50f2661756e6e6297fd43eacbcb6bad192d3963</frbrgroupid><rsrctype>conference_proceedings</rsrctype><prefilter>conference_proceedings</prefilter><language>eng</language><creationdate>2005</creationdate><topic>ANTIREFLECTION (AR) COATING</topic><topic>CAMERAS</topic><topic>COATINGS</topic><topic>Hydrogen</topic><topic>MATERIALS SCIENCE</topic><topic>Metallization</topic><topic>Optical films</topic><topic>Passivation</topic><topic>PHOTOCURRENT</topic><topic>Photovoltaic cells</topic><topic>PV</topic><topic>REFLECTANCE (INTENSITY) IMAGE</topic><topic>Reflectivity</topic><topic>Refractive index</topic><topic>SOLAR CELLS</topic><topic>SOLAR ENERGY</topic><topic>SOLAR ENERGY - PHOTOVOLTAICS</topic><topic>Solar power generation</topic><topic>THICKNESS</topic><topic>Thickness measurement</topic><topic>TRANSFORMATIONS</topic><toplevel>online_resources</toplevel><creatorcontrib>Sopori, B.</creatorcontrib><creatorcontrib>Amieva, J.</creatorcontrib><creatorcontrib>Butterfield, B.</creatorcontrib><creatorcontrib>Chuan Li</creatorcontrib><creatorcontrib>National Renewable Energy Lab., Golden, CO (US)</creatorcontrib><collection>IEEE Electronic Library (IEL) Conference Proceedings</collection><collection>IEEE Proceedings Order Plan (POP) 1998-present by volume</collection><collection>IEEE Xplore All Conference Proceedings</collection><collection>IEEE Electronic Library (IEL)</collection><collection>IEEE Proceedings Order Plans (POP) 1998-present</collection><collection>OSTI.GOV - Hybrid</collection><collection>OSTI.GOV</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Sopori, B.</au><au>Amieva, J.</au><au>Butterfield, B.</au><au>Chuan Li</au><aucorp>National Renewable Energy Lab., Golden, CO (US)</aucorp><format>book</format><genre>proceeding</genre><ristype>CONF</ristype><atitle>Rapid mapping of AR coating thickness on Si solar cells using GT-FabScan 6000</atitle><btitle>Conference Record of the Thirty-first IEEE Photovoltaic Specialists Conference, 2005</btitle><stitle>PVSC</stitle><date>2005-01-01</date><risdate>2005</risdate><spage>943</spage><epage>946</epage><pages>943-946</pages><issn>0160-8371</issn><isbn>9780780387072</isbn><isbn>0780387074</isbn><abstract>A new technique for rapid mapping of the thickness, of an antireflection (AR) coating on a solar cell is described. A filtered, reflectance (intensity) image of the AR-coated wafer is generated by a CCD camera mounted on a GTFabScan. This image is converted into a thickness image using a transformation relating local AR thickness to the local intensity in the image plane. The thickness map is generated in <100 ms.</abstract><cop>United States</cop><pub>IEEE</pub><doi>10.1109/PVSC.2005.1488287</doi><tpages>4</tpages><oa>free_for_read</oa></addata></record> |
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identifier | ISSN: 0160-8371 |
ispartof | Conference Record of the Thirty-first IEEE Photovoltaic Specialists Conference, 2005, 2005, p.943-946 |
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language | eng |
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source | IEEE Electronic Library (IEL) Conference Proceedings |
subjects | ANTIREFLECTION (AR) COATING CAMERAS COATINGS Hydrogen MATERIALS SCIENCE Metallization Optical films Passivation PHOTOCURRENT Photovoltaic cells PV REFLECTANCE (INTENSITY) IMAGE Reflectivity Refractive index SOLAR CELLS SOLAR ENERGY SOLAR ENERGY - PHOTOVOLTAICS Solar power generation THICKNESS Thickness measurement TRANSFORMATIONS |
title | Rapid mapping of AR coating thickness on Si solar cells using GT-FabScan 6000 |
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