Rapid mapping of AR coating thickness on Si solar cells using GT-FabScan 6000

A new technique for rapid mapping of the thickness, of an antireflection (AR) coating on a solar cell is described. A filtered, reflectance (intensity) image of the AR-coated wafer is generated by a CCD camera mounted on a GTFabScan. This image is converted into a thickness image using a transformat...

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Hauptverfasser: Sopori, B., Amieva, J., Butterfield, B., Chuan Li
Format: Tagungsbericht
Sprache:eng
Schlagworte:
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Zusammenfassung:A new technique for rapid mapping of the thickness, of an antireflection (AR) coating on a solar cell is described. A filtered, reflectance (intensity) image of the AR-coated wafer is generated by a CCD camera mounted on a GTFabScan. This image is converted into a thickness image using a transformation relating local AR thickness to the local intensity in the image plane. The thickness map is generated in
ISSN:0160-8371
DOI:10.1109/PVSC.2005.1488287