Novel realistic short structure construction for parasitic resistance de-embedding and on-wafer inductor characterization
The paper presents a novel method of using measured S-parameters of a through structure to construct the Z-parameters of a realistic short structure. By using this realistic short structure for parasitic resistance de-embedding, an on-wafer inductor has been characterized, and inductor parameters (Q...
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creator | Tao, J. Findley, P. Rezvani, G.A. |
description | The paper presents a novel method of using measured S-parameters of a through structure to construct the Z-parameters of a realistic short structure. By using this realistic short structure for parasitic resistance de-embedding, an on-wafer inductor has been characterized, and inductor parameters (Q, L and R) have been accurately extracted. |
doi_str_mv | 10.1109/ICMTS.2005.1452260 |
format | Conference Proceeding |
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By using this realistic short structure for parasitic resistance de-embedding, an on-wafer inductor has been characterized, and inductor parameters (Q, L and R) have been accurately extracted.</description><identifier>ISSN: 1071-9032</identifier><identifier>ISBN: 0780388550</identifier><identifier>ISBN: 9780780388550</identifier><identifier>EISSN: 2158-1029</identifier><identifier>DOI: 10.1109/ICMTS.2005.1452260</identifier><language>eng</language><publisher>IEEE</publisher><subject>Electrical resistance measurement ; Inductance ; Inductors ; Parasitic capacitance ; Performance evaluation ; Probes ; Q factor ; Radio frequency ; Scattering parameters ; Testing</subject><ispartof>Proceedings of the 2005 International Conference on Microelectronic Test Structures, 2005. 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By using this realistic short structure for parasitic resistance de-embedding, an on-wafer inductor has been characterized, and inductor parameters (Q, L and R) have been accurately extracted.</description><subject>Electrical resistance measurement</subject><subject>Inductance</subject><subject>Inductors</subject><subject>Parasitic capacitance</subject><subject>Performance evaluation</subject><subject>Probes</subject><subject>Q factor</subject><subject>Radio frequency</subject><subject>Scattering parameters</subject><subject>Testing</subject><issn>1071-9032</issn><issn>2158-1029</issn><isbn>0780388550</isbn><isbn>9780780388550</isbn><fulltext>true</fulltext><rsrctype>conference_proceeding</rsrctype><creationdate>2005</creationdate><recordtype>conference_proceeding</recordtype><sourceid>6IE</sourceid><sourceid>RIE</sourceid><recordid>eNp9j81OwzAQhC1-JFLgBeCyL-B07WCanCsQPcCF3ivX3lCj1K7WLqg8PanomdNoNPONNELcKayVwm66mL8u32uNaGr1YLR-xDNRaWVaqVB352KCsxabtjUGL0SlcKZkh42-EpOcPxE1KqMqcXhLXzQAkx1CLsFB3iQukAvvXdkzgUvxz4QUoU8MO8s2h2OVKY-MjY7Ak6TtmrwP8QNs9JCi_LY9MYToR3jk3GYEXSEOP_Y4diMueztkuj3ptbh_flrOX2QgotWOw9byYXW61vyf_gLL9FL9</recordid><startdate>2005</startdate><enddate>2005</enddate><creator>Tao, J.</creator><creator>Findley, P.</creator><creator>Rezvani, G.A.</creator><general>IEEE</general><scope>6IE</scope><scope>6IH</scope><scope>CBEJK</scope><scope>RIE</scope><scope>RIO</scope></search><sort><creationdate>2005</creationdate><title>Novel realistic short structure construction for parasitic resistance de-embedding and on-wafer inductor characterization</title><author>Tao, J. ; Findley, P. ; Rezvani, G.A.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-ieee_primary_14522603</frbrgroupid><rsrctype>conference_proceedings</rsrctype><prefilter>conference_proceedings</prefilter><language>eng</language><creationdate>2005</creationdate><topic>Electrical resistance measurement</topic><topic>Inductance</topic><topic>Inductors</topic><topic>Parasitic capacitance</topic><topic>Performance evaluation</topic><topic>Probes</topic><topic>Q factor</topic><topic>Radio frequency</topic><topic>Scattering parameters</topic><topic>Testing</topic><toplevel>online_resources</toplevel><creatorcontrib>Tao, J.</creatorcontrib><creatorcontrib>Findley, P.</creatorcontrib><creatorcontrib>Rezvani, G.A.</creatorcontrib><collection>IEEE Electronic Library (IEL) Conference Proceedings</collection><collection>IEEE Proceedings Order Plan (POP) 1998-present by volume</collection><collection>IEEE Xplore All Conference Proceedings</collection><collection>IEEE Electronic Library (IEL)</collection><collection>IEEE Proceedings Order Plans (POP) 1998-present</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Tao, J.</au><au>Findley, P.</au><au>Rezvani, G.A.</au><format>book</format><genre>proceeding</genre><ristype>CONF</ristype><atitle>Novel realistic short structure construction for parasitic resistance de-embedding and on-wafer inductor characterization</atitle><btitle>Proceedings of the 2005 International Conference on Microelectronic Test Structures, 2005. ICMTS 2005</btitle><stitle>ICMTS</stitle><date>2005</date><risdate>2005</risdate><spage>187</spage><epage>190</epage><pages>187-190</pages><issn>1071-9032</issn><eissn>2158-1029</eissn><isbn>0780388550</isbn><isbn>9780780388550</isbn><abstract>The paper presents a novel method of using measured S-parameters of a through structure to construct the Z-parameters of a realistic short structure. By using this realistic short structure for parasitic resistance de-embedding, an on-wafer inductor has been characterized, and inductor parameters (Q, L and R) have been accurately extracted.</abstract><pub>IEEE</pub><doi>10.1109/ICMTS.2005.1452260</doi></addata></record> |
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ispartof | Proceedings of the 2005 International Conference on Microelectronic Test Structures, 2005. ICMTS 2005, 2005, p.187-190 |
issn | 1071-9032 2158-1029 |
language | eng |
recordid | cdi_ieee_primary_1452260 |
source | IEEE Electronic Library (IEL) Conference Proceedings |
subjects | Electrical resistance measurement Inductance Inductors Parasitic capacitance Performance evaluation Probes Q factor Radio frequency Scattering parameters Testing |
title | Novel realistic short structure construction for parasitic resistance de-embedding and on-wafer inductor characterization |
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