Impurity atom diffusion into finite slices of semiconductor material
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| Veröffentlicht in: | Proceedings of the IEEE 1963-01, Vol.51 (2), p.372-373 |
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| container_end_page | 373 |
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| container_issue | 2 |
| container_start_page | 372 |
| container_title | Proceedings of the IEEE |
| container_volume | 51 |
| creator | Kennedy, D.P. Murley, P.C. |
| description | |
| doi_str_mv | 10.1109/PROC.1963.1788 |
| format | Article |
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| fulltext | fulltext_linktorsrc |
| identifier | ISSN: 0018-9219 |
| ispartof | Proceedings of the IEEE, 1963-01, Vol.51 (2), p.372-373 |
| issn | 0018-9219 1558-2256 |
| language | eng |
| recordid | cdi_ieee_primary_1443718 |
| source | IEEE Electronic Library (IEL) |
| subjects | Bismuth Cyclotrons Diffusion processes Frequency Plasma materials processing Plasma temperature Plasma waves Semiconductor impurities Semiconductor materials Solid state circuits |
| title | Impurity atom diffusion into finite slices of semiconductor material |
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