Performance comparison of MIM capacitors and metal finger capacitors for analog and RF applications

Performance comparison of MIM capacitors and metal finger capacitors for analog and RF applications

In this work, we compare silicon nitride MIM capacitors to metal finger capacitors and clarify the performance and cost trade-offs. Our measurements show that MIM capacitors are superior to metal finger capacitors in terms of matching and process tolerance, but equivalent metal finger capacitors hav...

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Bibliographische Detailangaben
Hauptverfasser: Lim, Q.S.I., Kordesch, A.V., Keating, R.A.
Format: Tagungsbericht
Sprache:eng
Schlagworte:
CMOS process
Costs
Fingers
Metal-insulator structures
MIM capacitors
MOS capacitors
Parasitic capacitance
Q factor
Radio frequency
Switched capacitor circuits
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Beschreibung
Zusammenfassung:In this work, we compare silicon nitride MIM capacitors to metal finger capacitors and clarify the performance and cost trade-offs. Our measurements show that MIM capacitors are superior to metal finger capacitors in terms of matching and process tolerance, but equivalent metal finger capacitors have higher Q, lower voltage coefficient and lower temperature coefficient.
DOI:10.1109/RFM.2004.1411082