Electromigration-dependent parametric yield estimation

We define and investigate the problem of electromigration faults caused by spot defects during the VLSI manufacturing process. Analysis is given for a simple layout, and simulations are presented and discussed for a more complicated case. It is shown that in some cases, electromigration-dependent pa...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: Barsky, R., Wagner, I.A.
Format: Tagungsbericht
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:We define and investigate the problem of electromigration faults caused by spot defects during the VLSI manufacturing process. Analysis is given for a simple layout, and simulations are presented and discussed for a more complicated case. It is shown that in some cases, electromigration-dependent parametric faults can make a significant contribution to the total yield estimation.
DOI:10.1109/ICECS.2004.1399629