Excess Lorentzian noise in partially depleted SOI nMOSFETs induced by an accumulation back-gate bias

It is shown that the application of an accumulation back-gate bias (V/sub GB/) to partially depleted silicon-on-insulator nMOSFETs induces an excess Lorentzian noise component in the front-channel current noise spectral density. The effect is observed for front-gate biases (V/sub GF/) from weak to s...

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Veröffentlicht in:IEEE electron device letters 2004-06, Vol.25 (6), p.433-435
Hauptverfasser: Lukyanchikova, N., Garbar, N., Smolanka, A., Simoen, E., Claeys, C.
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Sprache:eng
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Zusammenfassung:It is shown that the application of an accumulation back-gate bias (V/sub GB/) to partially depleted silicon-on-insulator nMOSFETs induces an excess Lorentzian noise component in the front-channel current noise spectral density. The effect is observed for front-gate biases (V/sub GF/) from weak to strong inversion. Below the threshold for electron valence band (EVB) tunnelling, the parameters of the Lorentzian noise are independent on V/sub GF/, but strong functions of V/sub GB/. Given the similarity with the behaviour of the EVB tunnelling-related noise overshoot, the observations are interpreted in a similar way. It is proposed that the additional source of floating-body related excess Lorentzian noise is shot and thermal noise in the body charge, filtered by the RC impedance of the source-body junction. The possible origin of the body-charge fluctuations and related shot and thermal noise will be discussed.
ISSN:0741-3106
1558-0563
DOI:10.1109/LED.2004.828961