Generation of photonic crystal patterns by single-spot electron beam lithography

Generation of photonic crystal patterns by single-spot electron beam lithography

A new method of patterning photonic crystal (PhC) structures by single-spot electron-beam exposure scheme is presented. An order-of-magnitude reduction in the required job time compared to that for the conventional multispot scheme has been achieved.

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Bibliographische Detailangaben
Hauptverfasser: Kim, S., Chong, H., De La Rue, R.M., Marsh, J.H., Bryce, A.C.
Format: Tagungsbericht
Sprache:eng
Schlagworte:
Electron beams
Holography
Lithography
Optical device fabrication
Photonic crystals
Resists
Scanning electron microscopy
Telephony
Testing
Writing
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Beschreibung
Zusammenfassung:A new method of patterning photonic crystal (PhC) structures by single-spot electron-beam exposure scheme is presented. An order-of-magnitude reduction in the required job time compared to that for the conventional multispot scheme has been achieved.