Time-multiplexed plasma-etching of high numerical aperture paraboloidal micromirror arrays

Time-multiplexed plasma-etching of high numerical aperture paraboloidal micromirror arrays

This paper presents a time-multiplexed plasma-etching method for high numerical aperture paraboloidal micromirrors. By designing the appropriate opening and spacing of etching windows, one can fabricate micromirror arrays with varying focal lengths within one batch.

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Hauptverfasser: Wang, K., Bohringer, K.F.
Format: Tagungsbericht
Sprache:eng
Schlagworte:
Apertures
Etching
Fabrication
Lenses
Micromirrors
Mirrors
Optical reflection
Plasma applications
Plasma properties
Resonance light scattering
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Bohringer, K.F.
description This paper presents a time-multiplexed plasma-etching method for high numerical aperture paraboloidal micromirrors. By designing the appropriate opening and spacing of etching windows, one can fabricate micromirror arrays with varying focal lengths within one batch.
doi_str_mv 10.1109/CLEOPR.2003.1274774
format Conference Proceeding
fullrecord <record><control><sourceid>ieee_6IE</sourceid><recordid>TN_cdi_ieee_primary_1274774</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><ieee_id>1274774</ieee_id><sourcerecordid>1274774</sourcerecordid><originalsourceid>FETCH-LOGICAL-i1354-b7fba60cd82a846ad6b81e5cf4cd16f547d8bcc62fec42a38b0b7a8c1751fcb63</originalsourceid><addsrcrecordid>eNotkMtqwzAURAWl0JLmC7LRD9iVLFmSl8WkDwgklHTTTbiSrhIVKzayDc3fN9AMAwdmcRZDyIqzknPWPLeb9Xb3WVaMiZJXWmot78iy0YZdK7RWij2Q5Tj-sGtEI3TNHsn3PiYs0txNcejwFz0dOhgTFDi5UzwfaR_oKR5P9DwnzNFBR2HAPM0Z6QAZbN_10V_XFF3uU8y5zxRyhsv4RO4DdCMub1yQr9f1vn0vNtu3j_ZlU0QuallYHSwo5rypwEgFXlnDsXZBOs9VqKX2xjqnqoBOViCMZVaDcVzXPDirxIKs_r0REQ9Djgny5XB7QPwBcJFUvQ</addsrcrecordid><sourcetype>Publisher</sourcetype><iscdi>true</iscdi><recordtype>conference_proceeding</recordtype></control><display><type>conference_proceeding</type><title>Time-multiplexed plasma-etching of high numerical aperture paraboloidal micromirror arrays</title><source>IEEE Electronic Library (IEL) Conference Proceedings</source><creator>Wang, K. ; Bohringer, K.F.</creator><creatorcontrib>Wang, K. ; Bohringer, K.F.</creatorcontrib><description>This paper presents a time-multiplexed plasma-etching method for high numerical aperture paraboloidal micromirrors. By designing the appropriate opening and spacing of etching windows, one can fabricate micromirror arrays with varying focal lengths within one batch.</description><identifier>ISBN: 9780780377660</identifier><identifier>ISBN: 0780377664</identifier><identifier>DOI: 10.1109/CLEOPR.2003.1274774</identifier><language>eng</language><publisher>IEEE</publisher><subject>Apertures ; Etching ; Fabrication ; Lenses ; Micromirrors ; Mirrors ; Optical reflection ; Plasma applications ; Plasma properties ; Resonance light scattering</subject><ispartof>CLEO/Pacific Rim 2003. The 5th Pacific Rim Conference on Lasers and Electro-Optics (IEEE Cat. No.03TH8671), 2003, Vol.1, p.317 Vol.1</ispartof><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://ieeexplore.ieee.org/document/1274774$$EHTML$$P50$$Gieee$$H</linktohtml><link.rule.ids>309,310,776,780,785,786,2052,4036,4037,27902,54895</link.rule.ids><linktorsrc>$$Uhttps://ieeexplore.ieee.org/document/1274774$$EView_record_in_IEEE$$FView_record_in_$$GIEEE</linktorsrc></links><search><creatorcontrib>Wang, K.</creatorcontrib><creatorcontrib>Bohringer, K.F.</creatorcontrib><title>Time-multiplexed plasma-etching of high numerical aperture paraboloidal micromirror arrays</title><title>CLEO/Pacific Rim 2003. The 5th Pacific Rim Conference on Lasers and Electro-Optics (IEEE Cat. No.03TH8671)</title><addtitle>CLEOPR</addtitle><description>This paper presents a time-multiplexed plasma-etching method for high numerical aperture paraboloidal micromirrors. By designing the appropriate opening and spacing of etching windows, one can fabricate micromirror arrays with varying focal lengths within one batch.</description><subject>Apertures</subject><subject>Etching</subject><subject>Fabrication</subject><subject>Lenses</subject><subject>Micromirrors</subject><subject>Mirrors</subject><subject>Optical reflection</subject><subject>Plasma applications</subject><subject>Plasma properties</subject><subject>Resonance light scattering</subject><isbn>9780780377660</isbn><isbn>0780377664</isbn><fulltext>true</fulltext><rsrctype>conference_proceeding</rsrctype><creationdate>2003</creationdate><recordtype>conference_proceeding</recordtype><sourceid>6IE</sourceid><sourceid>RIE</sourceid><recordid>eNotkMtqwzAURAWl0JLmC7LRD9iVLFmSl8WkDwgklHTTTbiSrhIVKzayDc3fN9AMAwdmcRZDyIqzknPWPLeb9Xb3WVaMiZJXWmot78iy0YZdK7RWij2Q5Tj-sGtEI3TNHsn3PiYs0txNcejwFz0dOhgTFDi5UzwfaR_oKR5P9DwnzNFBR2HAPM0Z6QAZbN_10V_XFF3uU8y5zxRyhsv4RO4DdCMub1yQr9f1vn0vNtu3j_ZlU0QuallYHSwo5rypwEgFXlnDsXZBOs9VqKX2xjqnqoBOViCMZVaDcVzXPDirxIKs_r0REQ9Djgny5XB7QPwBcJFUvQ</recordid><startdate>2003</startdate><enddate>2003</enddate><creator>Wang, K.</creator><creator>Bohringer, K.F.</creator><general>IEEE</general><scope>6IE</scope><scope>6IL</scope><scope>CBEJK</scope><scope>RIE</scope><scope>RIL</scope></search><sort><creationdate>2003</creationdate><title>Time-multiplexed plasma-etching of high numerical aperture paraboloidal micromirror arrays</title><author>Wang, K. ; Bohringer, K.F.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-i1354-b7fba60cd82a846ad6b81e5cf4cd16f547d8bcc62fec42a38b0b7a8c1751fcb63</frbrgroupid><rsrctype>conference_proceedings</rsrctype><prefilter>conference_proceedings</prefilter><language>eng</language><creationdate>2003</creationdate><topic>Apertures</topic><topic>Etching</topic><topic>Fabrication</topic><topic>Lenses</topic><topic>Micromirrors</topic><topic>Mirrors</topic><topic>Optical reflection</topic><topic>Plasma applications</topic><topic>Plasma properties</topic><topic>Resonance light scattering</topic><toplevel>online_resources</toplevel><creatorcontrib>Wang, K.</creatorcontrib><creatorcontrib>Bohringer, K.F.</creatorcontrib><collection>IEEE Electronic Library (IEL) Conference Proceedings</collection><collection>IEEE Proceedings Order Plan All Online (POP All Online) 1998-present by volume</collection><collection>IEEE Xplore All Conference Proceedings</collection><collection>IEEE Electronic Library (IEL)</collection><collection>IEEE Proceedings Order Plans (POP All) 1998-Present</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Wang, K.</au><au>Bohringer, K.F.</au><format>book</format><genre>proceeding</genre><ristype>CONF</ristype><atitle>Time-multiplexed plasma-etching of high numerical aperture paraboloidal micromirror arrays</atitle><btitle>CLEO/Pacific Rim 2003. The 5th Pacific Rim Conference on Lasers and Electro-Optics (IEEE Cat. No.03TH8671)</btitle><stitle>CLEOPR</stitle><date>2003</date><risdate>2003</risdate><volume>1</volume><spage>317 Vol.1</spage><pages>317 Vol.1-</pages><isbn>9780780377660</isbn><isbn>0780377664</isbn><abstract>This paper presents a time-multiplexed plasma-etching method for high numerical aperture paraboloidal micromirrors. By designing the appropriate opening and spacing of etching windows, one can fabricate micromirror arrays with varying focal lengths within one batch.</abstract><pub>IEEE</pub><doi>10.1109/CLEOPR.2003.1274774</doi><oa>free_for_read</oa></addata></record>
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identifier ISBN: 9780780377660
ispartof CLEO/Pacific Rim 2003. The 5th Pacific Rim Conference on Lasers and Electro-Optics (IEEE Cat. No.03TH8671), 2003, Vol.1, p.317 Vol.1
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source IEEE Electronic Library (IEL) Conference Proceedings
subjects Apertures
Etching
Fabrication
Lenses
Micromirrors
Mirrors
Optical reflection
Plasma applications
Plasma properties
Resonance light scattering
title Time-multiplexed plasma-etching of high numerical aperture paraboloidal micromirror arrays
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-28T13%3A10%3A40IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-ieee_6IE&rft_val_fmt=info:ofi/fmt:kev:mtx:book&rft.genre=proceeding&rft.atitle=Time-multiplexed%20plasma-etching%20of%20high%20numerical%20aperture%20paraboloidal%20micromirror%20arrays&rft.btitle=CLEO/Pacific%20Rim%202003.%20The%205th%20Pacific%20Rim%20Conference%20on%20Lasers%20and%20Electro-Optics%20(IEEE%20Cat.%20No.03TH8671)&rft.au=Wang,%20K.&rft.date=2003&rft.volume=1&rft.spage=317%20Vol.1&rft.pages=317%20Vol.1-&rft.isbn=9780780377660&rft.isbn_list=0780377664&rft_id=info:doi/10.1109/CLEOPR.2003.1274774&rft_dat=%3Cieee_6IE%3E1274774%3C/ieee_6IE%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rft_ieee_id=1274774&rfr_iscdi=true