Time-multiplexed plasma-etching of high numerical aperture paraboloidal micromirror arrays

Time-multiplexed plasma-etching of high numerical aperture paraboloidal micromirror arrays

This paper presents a time-multiplexed plasma-etching method for high numerical aperture paraboloidal micromirrors. By designing the appropriate opening and spacing of etching windows, one can fabricate micromirror arrays with varying focal lengths within one batch.

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Bibliographische Detailangaben
Hauptverfasser: Wang, K., Bohringer, K.F.
Format: Tagungsbericht
Sprache:eng
Schlagworte:
Apertures
Etching
Fabrication
Lenses
Micromirrors
Mirrors
Optical reflection
Plasma applications
Plasma properties
Resonance light scattering
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Beschreibung
Zusammenfassung:This paper presents a time-multiplexed plasma-etching method for high numerical aperture paraboloidal micromirrors. By designing the appropriate opening and spacing of etching windows, one can fabricate micromirror arrays with varying focal lengths within one batch.
DOI:10.1109/CLEOPR.2003.1274774