Impact ionization in strained-Si/SiGe heterostructures
We have experimentally studied impact ionization (II) in a strained-Si/SiGe heterostructure. We found that, unlike bulk Si, II in this heterostructure has a positive temperature coefficient. Coupled with the severe self-heating that characterizes this heterostructure, this results in significantly h...
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creator | Waldron, N.S. Pitera, A.J. Lee, M.L. Fitzgerald, E.A. del Alamo, J.A. |
description | We have experimentally studied impact ionization (II) in a strained-Si/SiGe heterostructure. We found that, unlike bulk Si, II in this heterostructure has a positive temperature coefficient. Coupled with the severe self-heating that characterizes this heterostructure, this results in significantly higher levels of II when compared with reference Si devices operating under identical conditions. |
doi_str_mv | 10.1109/IEDM.2003.1269404 |
format | Conference Proceeding |
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We found that, unlike bulk Si, II in this heterostructure has a positive temperature coefficient. 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We found that, unlike bulk Si, II in this heterostructure has a positive temperature coefficient. Coupled with the severe self-heating that characterizes this heterostructure, this results in significantly higher levels of II when compared with reference Si devices operating under identical conditions.</description><subject>Buffer layers</subject><subject>CMOS technology</subject><subject>Germanium silicon alloys</subject><subject>Impact ionization</subject><subject>Radio frequency</subject><subject>Resistors</subject><subject>Rough surfaces</subject><subject>Silicon germanium</subject><subject>Testing</subject><subject>Thermal conductivity</subject><isbn>0780378725</isbn><isbn>9780780378728</isbn><fulltext>true</fulltext><rsrctype>conference_proceeding</rsrctype><creationdate>2003</creationdate><recordtype>conference_proceeding</recordtype><sourceid>6IE</sourceid><sourceid>RIE</sourceid><recordid>eNpjYJA0NNAzNDSw1Pd0dfHVMzIwMNYzNDKzNDEwYWbgMjC3MDA2tzA3MuVg4C0uzjIAAhNTEzMjS04GM8_cgsTkEoXM_LzMqsQSIKWQmadQXFKUmJmXmqIbnKkfnOmeqpCRWpJalA8ULk0uKS1KLeZhYE1LzClO5YXS3AzSbq4hzh66mampqfEFRZm5iUWV8VAnGOOXBQBlCjVq</recordid><startdate>2003</startdate><enddate>2003</enddate><creator>Waldron, N.S.</creator><creator>Pitera, A.J.</creator><creator>Lee, M.L.</creator><creator>Fitzgerald, E.A.</creator><creator>del Alamo, J.A.</creator><general>IEEE</general><scope>6IE</scope><scope>6IH</scope><scope>CBEJK</scope><scope>RIE</scope><scope>RIO</scope></search><sort><creationdate>2003</creationdate><title>Impact ionization in strained-Si/SiGe heterostructures</title><author>Waldron, N.S. ; Pitera, A.J. ; Lee, M.L. ; Fitzgerald, E.A. ; del Alamo, J.A.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-ieee_primary_12694043</frbrgroupid><rsrctype>conference_proceedings</rsrctype><prefilter>conference_proceedings</prefilter><language>eng</language><creationdate>2003</creationdate><topic>Buffer layers</topic><topic>CMOS technology</topic><topic>Germanium silicon alloys</topic><topic>Impact ionization</topic><topic>Radio frequency</topic><topic>Resistors</topic><topic>Rough surfaces</topic><topic>Silicon germanium</topic><topic>Testing</topic><topic>Thermal conductivity</topic><toplevel>online_resources</toplevel><creatorcontrib>Waldron, N.S.</creatorcontrib><creatorcontrib>Pitera, A.J.</creatorcontrib><creatorcontrib>Lee, M.L.</creatorcontrib><creatorcontrib>Fitzgerald, E.A.</creatorcontrib><creatorcontrib>del Alamo, J.A.</creatorcontrib><collection>IEEE Electronic Library (IEL) Conference Proceedings</collection><collection>IEEE Proceedings Order Plan (POP) 1998-present by volume</collection><collection>IEEE Xplore All Conference Proceedings</collection><collection>IEEE Electronic Library (IEL)</collection><collection>IEEE Proceedings Order Plans (POP) 1998-present</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Waldron, N.S.</au><au>Pitera, A.J.</au><au>Lee, M.L.</au><au>Fitzgerald, E.A.</au><au>del Alamo, J.A.</au><format>book</format><genre>proceeding</genre><ristype>CONF</ristype><atitle>Impact ionization in strained-Si/SiGe heterostructures</atitle><btitle>IEEE International Electron Devices Meeting 2003</btitle><stitle>IEDM</stitle><date>2003</date><risdate>2003</risdate><spage>33.7.1</spage><epage>33.7.4</epage><pages>33.7.1-33.7.4</pages><isbn>0780378725</isbn><isbn>9780780378728</isbn><abstract>We have experimentally studied impact ionization (II) in a strained-Si/SiGe heterostructure. We found that, unlike bulk Si, II in this heterostructure has a positive temperature coefficient. Coupled with the severe self-heating that characterizes this heterostructure, this results in significantly higher levels of II when compared with reference Si devices operating under identical conditions.</abstract><pub>IEEE</pub><doi>10.1109/IEDM.2003.1269404</doi></addata></record> |
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subjects | Buffer layers CMOS technology Germanium silicon alloys Impact ionization Radio frequency Resistors Rough surfaces Silicon germanium Testing Thermal conductivity |
title | Impact ionization in strained-Si/SiGe heterostructures |
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