65 nm device manufacture using shaped E-Beam lithography

In this paper, SRAM cell device manufacture using shaped electron beam lithography was developed. TEM view of SRAM cell was showed.

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Bibliographische Detailangaben
Hauptverfasser:	Pain, L., Charpin, M., Laplanche, Y., Todeschini, J., Leininger, H., Tourniol, S., Faure, R., Bossy, X., Palla, R., Beverina, A., Broekaart, M., Judong, F., Brosselin, K., Le Friec, Y., Leverd, F., De Jonghe, V., Josse, E., Hinsinger, O., Brun, P., Henry, D., Woo, M., Stolk, P., Arnaud, F.
Format:	Tagungsbericht
Sprache:	eng
Schlagworte:	Costs Electron optics Lithography Manufacturing Optical attenuators Pain Production Prototypes Research and development Throughput
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Beschreibung
Zusammenfassung:	In this paper, SRAM cell device manufacture using shaped electron beam lithography was developed. TEM view of SRAM cell was showed.
DOI:	10.1109/IMNC.2003.1268624