Advantageous exposure of X architecture pattern when using a variable shaped beam tool

Advantageous exposure of X architecture pattern when using a variable shaped beam tool

Summary form only given. In this paper, the advantageous exposure of X architecture pattern when using a variable shaped beam tool is discussed. A X architecture pattern contains lines which represents a Manhatten pattern itself, but 45 degrees rotated additionally. To expose this kind of pattern wi...

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Hauptverfasser: Dorl, W., Boettcher, M., Eichhorn, H.-G., Gramss, J., Hahmann, P., Lemke, M., Schnabel, B., Weidenmueller, U.
Format: Tagungsbericht
Sprache:eng
Schlagworte:
Data handling
Electron beams
Lithography
Routing
Testing
Throughput
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Beschreibung
Zusammenfassung:Summary form only given. In this paper, the advantageous exposure of X architecture pattern when using a variable shaped beam tool is discussed. A X architecture pattern contains lines which represents a Manhatten pattern itself, but 45 degrees rotated additionally. To expose this kind of pattern with high throughout and high pattern fidelity is a challenging task.
DOI:10.1109/IMNC.2003.1268596