Silicon IMPATT diodes of improved reliability
We present the results of our investigation of silicon double-drift diodes intended for the millimeter wavelength range. Their ohmic contacts to the n/sup +/-area were based on the Pd/sub 2/Si-Ti-Pd-Au metallization, while those to the p/sup +/-area were based on the Pd/sub 2/Si-TiN-Ti-Au metallizat...
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creator | Boltovetes, N.S. Basanets, V.V. Ovar, A.V. Kurakin, A.M. Venger, E.F. Konakova, R.V. Milenin, V.V. Soloviev, E.A. |
description | We present the results of our investigation of silicon double-drift diodes intended for the millimeter wavelength range. Their ohmic contacts to the n/sup +/-area were based on the Pd/sub 2/Si-Ti-Pd-Au metallization, while those to the p/sup +/-area were based on the Pd/sub 2/Si-TiN-Ti-Au metallization. The accelerated tests of these IMPATT diodes at T=335, 346 and 375/spl deg/C have shown that the activation energy of degradation processes was 2.03 eV. An analysis of the diodes after failure has shown that no parametric failures occurred; the only mechanism for failures was metal penetration through the mesa. |
doi_str_mv | 10.1109/CRMICO.2000.1255878 |
format | Conference Proceeding |
fullrecord | <record><control><sourceid>ieee_6IE</sourceid><recordid>TN_cdi_ieee_primary_1255878</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><ieee_id>1255878</ieee_id><sourcerecordid>1255878</sourcerecordid><originalsourceid>FETCH-ieee_primary_12558783</originalsourceid><addsrcrecordid>eNpjYJA2NNAzNDSw1HcO8vV09tczMjAAChiZmlqYWzAzcFmamZmaGxmYWBhyMPAWF2cBZQ1MTE0sDc04GXSDM3Myk_PzFDx9AxxDQhRSMvNTUosV8tMUMnMLivLLUlMUilJzMhOTgMpKKnkYWNMSc4pTeaE0N4O0m2uIs4duZmpqanxBUWZuYlFlPNRmY_yyAHCdMes</addsrcrecordid><sourcetype>Publisher</sourcetype><iscdi>true</iscdi><recordtype>conference_proceeding</recordtype></control><display><type>conference_proceeding</type><title>Silicon IMPATT diodes of improved reliability</title><source>IEEE Electronic Library (IEL) Conference Proceedings</source><creator>Boltovetes, N.S. ; Basanets, V.V. ; Ovar, A.V. ; Kurakin, A.M. ; Venger, E.F. ; Konakova, R.V. ; Milenin, V.V. ; Soloviev, E.A.</creator><creatorcontrib>Boltovetes, N.S. ; Basanets, V.V. ; Ovar, A.V. ; Kurakin, A.M. ; Venger, E.F. ; Konakova, R.V. ; Milenin, V.V. ; Soloviev, E.A.</creatorcontrib><description>We present the results of our investigation of silicon double-drift diodes intended for the millimeter wavelength range. Their ohmic contacts to the n/sup +/-area were based on the Pd/sub 2/Si-Ti-Pd-Au metallization, while those to the p/sup +/-area were based on the Pd/sub 2/Si-TiN-Ti-Au metallization. The accelerated tests of these IMPATT diodes at T=335, 346 and 375/spl deg/C have shown that the activation energy of degradation processes was 2.03 eV. An analysis of the diodes after failure has shown that no parametric failures occurred; the only mechanism for failures was metal penetration through the mesa.</description><identifier>ISBN: 9665720481</identifier><identifier>ISBN: 9789665720485</identifier><identifier>DOI: 10.1109/CRMICO.2000.1255878</identifier><language>eng</language><publisher>IEEE</publisher><subject>Diodes ; Gaussian processes ; Helium ; Indium tin oxide ; Microwave technology ; Silicon</subject><ispartof>2000 10th International Crimean Microwave Conference. "Microwave and Telecommunication Technology". Conference Proceedings (IEEE Cat. No.00EX415), 2000, p.139-140</ispartof><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://ieeexplore.ieee.org/document/1255878$$EHTML$$P50$$Gieee$$H</linktohtml><link.rule.ids>309,310,776,780,785,786,2052,4036,4037,27902,54895</link.rule.ids><linktorsrc>$$Uhttps://ieeexplore.ieee.org/document/1255878$$EView_record_in_IEEE$$FView_record_in_$$GIEEE</linktorsrc></links><search><creatorcontrib>Boltovetes, N.S.</creatorcontrib><creatorcontrib>Basanets, V.V.</creatorcontrib><creatorcontrib>Ovar, A.V.</creatorcontrib><creatorcontrib>Kurakin, A.M.</creatorcontrib><creatorcontrib>Venger, E.F.</creatorcontrib><creatorcontrib>Konakova, R.V.</creatorcontrib><creatorcontrib>Milenin, V.V.</creatorcontrib><creatorcontrib>Soloviev, E.A.</creatorcontrib><title>Silicon IMPATT diodes of improved reliability</title><title>2000 10th International Crimean Microwave Conference. "Microwave and Telecommunication Technology". Conference Proceedings (IEEE Cat. No.00EX415)</title><addtitle>CRMICO</addtitle><description>We present the results of our investigation of silicon double-drift diodes intended for the millimeter wavelength range. Their ohmic contacts to the n/sup +/-area were based on the Pd/sub 2/Si-Ti-Pd-Au metallization, while those to the p/sup +/-area were based on the Pd/sub 2/Si-TiN-Ti-Au metallization. The accelerated tests of these IMPATT diodes at T=335, 346 and 375/spl deg/C have shown that the activation energy of degradation processes was 2.03 eV. An analysis of the diodes after failure has shown that no parametric failures occurred; the only mechanism for failures was metal penetration through the mesa.</description><subject>Diodes</subject><subject>Gaussian processes</subject><subject>Helium</subject><subject>Indium tin oxide</subject><subject>Microwave technology</subject><subject>Silicon</subject><isbn>9665720481</isbn><isbn>9789665720485</isbn><fulltext>true</fulltext><rsrctype>conference_proceeding</rsrctype><creationdate>2000</creationdate><recordtype>conference_proceeding</recordtype><sourceid>6IE</sourceid><sourceid>RIE</sourceid><recordid>eNpjYJA2NNAzNDSw1HcO8vV09tczMjAAChiZmlqYWzAzcFmamZmaGxmYWBhyMPAWF2cBZQ1MTE0sDc04GXSDM3Myk_PzFDx9AxxDQhRSMvNTUosV8tMUMnMLivLLUlMUilJzMhOTgMpKKnkYWNMSc4pTeaE0N4O0m2uIs4duZmpqanxBUWZuYlFlPNRmY_yyAHCdMes</recordid><startdate>2000</startdate><enddate>2000</enddate><creator>Boltovetes, N.S.</creator><creator>Basanets, V.V.</creator><creator>Ovar, A.V.</creator><creator>Kurakin, A.M.</creator><creator>Venger, E.F.</creator><creator>Konakova, R.V.</creator><creator>Milenin, V.V.</creator><creator>Soloviev, E.A.</creator><general>IEEE</general><scope>6IE</scope><scope>6IL</scope><scope>CBEJK</scope><scope>RIE</scope><scope>RIL</scope></search><sort><creationdate>2000</creationdate><title>Silicon IMPATT diodes of improved reliability</title><author>Boltovetes, N.S. ; Basanets, V.V. ; Ovar, A.V. ; Kurakin, A.M. ; Venger, E.F. ; Konakova, R.V. ; Milenin, V.V. ; Soloviev, E.A.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-ieee_primary_12558783</frbrgroupid><rsrctype>conference_proceedings</rsrctype><prefilter>conference_proceedings</prefilter><language>eng</language><creationdate>2000</creationdate><topic>Diodes</topic><topic>Gaussian processes</topic><topic>Helium</topic><topic>Indium tin oxide</topic><topic>Microwave technology</topic><topic>Silicon</topic><toplevel>online_resources</toplevel><creatorcontrib>Boltovetes, N.S.</creatorcontrib><creatorcontrib>Basanets, V.V.</creatorcontrib><creatorcontrib>Ovar, A.V.</creatorcontrib><creatorcontrib>Kurakin, A.M.</creatorcontrib><creatorcontrib>Venger, E.F.</creatorcontrib><creatorcontrib>Konakova, R.V.</creatorcontrib><creatorcontrib>Milenin, V.V.</creatorcontrib><creatorcontrib>Soloviev, E.A.</creatorcontrib><collection>IEEE Electronic Library (IEL) Conference Proceedings</collection><collection>IEEE Proceedings Order Plan All Online (POP All Online) 1998-present by volume</collection><collection>IEEE Xplore All Conference Proceedings</collection><collection>IEEE Electronic Library (IEL)</collection><collection>IEEE Proceedings Order Plans (POP All) 1998-Present</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Boltovetes, N.S.</au><au>Basanets, V.V.</au><au>Ovar, A.V.</au><au>Kurakin, A.M.</au><au>Venger, E.F.</au><au>Konakova, R.V.</au><au>Milenin, V.V.</au><au>Soloviev, E.A.</au><format>book</format><genre>proceeding</genre><ristype>CONF</ristype><atitle>Silicon IMPATT diodes of improved reliability</atitle><btitle>2000 10th International Crimean Microwave Conference. "Microwave and Telecommunication Technology". Conference Proceedings (IEEE Cat. No.00EX415)</btitle><stitle>CRMICO</stitle><date>2000</date><risdate>2000</risdate><spage>139</spage><epage>140</epage><pages>139-140</pages><isbn>9665720481</isbn><isbn>9789665720485</isbn><abstract>We present the results of our investigation of silicon double-drift diodes intended for the millimeter wavelength range. Their ohmic contacts to the n/sup +/-area were based on the Pd/sub 2/Si-Ti-Pd-Au metallization, while those to the p/sup +/-area were based on the Pd/sub 2/Si-TiN-Ti-Au metallization. The accelerated tests of these IMPATT diodes at T=335, 346 and 375/spl deg/C have shown that the activation energy of degradation processes was 2.03 eV. An analysis of the diodes after failure has shown that no parametric failures occurred; the only mechanism for failures was metal penetration through the mesa.</abstract><pub>IEEE</pub><doi>10.1109/CRMICO.2000.1255878</doi></addata></record> |
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subjects | Diodes Gaussian processes Helium Indium tin oxide Microwave technology Silicon |
title | Silicon IMPATT diodes of improved reliability |
url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-31T23%3A28%3A14IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-ieee_6IE&rft_val_fmt=info:ofi/fmt:kev:mtx:book&rft.genre=proceeding&rft.atitle=Silicon%20IMPATT%20diodes%20of%20improved%20reliability&rft.btitle=2000%2010th%20International%20Crimean%20Microwave%20Conference.%20%22Microwave%20and%20Telecommunication%20Technology%22.%20Conference%20Proceedings%20(IEEE%20Cat.%20No.00EX415)&rft.au=Boltovetes,%20N.S.&rft.date=2000&rft.spage=139&rft.epage=140&rft.pages=139-140&rft.isbn=9665720481&rft.isbn_list=9789665720485&rft_id=info:doi/10.1109/CRMICO.2000.1255878&rft_dat=%3Cieee_6IE%3E1255878%3C/ieee_6IE%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rft_ieee_id=1255878&rfr_iscdi=true |