Hot electron effects on undoped AlGaN/GaN high electron mobility transistors

Summary form only given. In this work, we report on the effects of hot electron stress on the degradation of undoped Al/sub 0.3/GaN/sub 0.7//GaN power HEMT's with SiN passivation, consisting of a decrease in the drain current, an increase in the parasitic drain and source resistance, and a shif...

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Hauptverfasser: Kim, H., Vertiatchikh, A., Tilak, V., Thompson, R.M., Prunty, T., Shealy, J.R., Eastman, L.F.
Format: Tagungsbericht
Sprache:eng
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Zusammenfassung:Summary form only given. In this work, we report on the effects of hot electron stress on the degradation of undoped Al/sub 0.3/GaN/sub 0.7//GaN power HEMT's with SiN passivation, consisting of a decrease in the drain current, an increase in the parasitic drain and source resistance, and a shift in threshold voltage. The stressed devices suffered from aggravated drain current slump (DC to RF dispersion). Pulsed I-V measurements and current-mode deep level transient spectroscopy (DLTS) suggested possible changes in surface charge profiles occurred during hot electron stress test. The nature of degradation under hot electron stress was irreversible.
DOI:10.1109/GAAS.2002.1167856