Photoelectric In-Memory Logic and Computing Achieved in HfO2-Based Ferroelectric Optoelectronic Memcapacitors

We experimentally reported the photoelectric in-memory logic and computing capabilities of HfO2-based ferroelectric optoelectronic memcapacitors (FOMs). By optimizing the annealing process at 600 °C, we achieve a robust noise margin and a substantial photoelectric memory window exceeding 9 fF/ \mu m...

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Veröffentlicht in:IEEE electron device letters 2024-07, Vol.45 (7), p.1357-1360
Hauptverfasser: Liu, Ning, Zhou, Jiuren, Zheng, Siying, Jin, Faxin, Fang, Cizhe, Chen, Bing, Liu, Yan, Hao, Yue, Han, Genquan
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Sprache:eng
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Zusammenfassung:We experimentally reported the photoelectric in-memory logic and computing capabilities of HfO2-based ferroelectric optoelectronic memcapacitors (FOMs). By optimizing the annealing process at 600 °C, we achieve a robust noise margin and a substantial photoelectric memory window exceeding 9 fF/ \mu m2, accompanied by an exceptionally low static energy cost below an attojoule per operation. Subsequently, our FOMs gained the capability for reconfigurable photoelectric in-memory Boolean logics of "NAND/NOT" and neuromorphic computing-based hand-written digit image recognition with an accuracy of 92%. These results signify a significant advancement towards energy-efficient sensing-memory-computing electronics, promising next-generation applications in pattern recognition, machine vision, and beyond.
ISSN:0741-3106
1558-0563
DOI:10.1109/LED.2024.3400990