Photoelectric In-Memory Logic and Computing Achieved in HfO2-Based Ferroelectric Optoelectronic Memcapacitors
We experimentally reported the photoelectric in-memory logic and computing capabilities of HfO2-based ferroelectric optoelectronic memcapacitors (FOMs). By optimizing the annealing process at 600 °C, we achieve a robust noise margin and a substantial photoelectric memory window exceeding 9 fF/ \mu m...
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Veröffentlicht in: | IEEE electron device letters 2024-07, Vol.45 (7), p.1357-1360 |
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Sprache: | eng |
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Zusammenfassung: | We experimentally reported the photoelectric in-memory logic and computing capabilities of HfO2-based ferroelectric optoelectronic memcapacitors (FOMs). By optimizing the annealing process at 600 °C, we achieve a robust noise margin and a substantial photoelectric memory window exceeding 9 fF/ \mu m2, accompanied by an exceptionally low static energy cost below an attojoule per operation. Subsequently, our FOMs gained the capability for reconfigurable photoelectric in-memory Boolean logics of "NAND/NOT" and neuromorphic computing-based hand-written digit image recognition with an accuracy of 92%. These results signify a significant advancement towards energy-efficient sensing-memory-computing electronics, promising next-generation applications in pattern recognition, machine vision, and beyond. |
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ISSN: | 0741-3106 1558-0563 |
DOI: | 10.1109/LED.2024.3400990 |