Fabrication of photonic crystals in silicon-on-insulator using 248-nm deep UV lithography
We demonstrate wavelength-scale photonic nanostructures, including photonic crystals, fabricated in silicon-on-insulator using deep ultraviolet (UV) lithography. We discuss the mass-manufacturing capabilities of deep UV lithography compared to e-beam lithography. This is illustrated with experimenta...
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| Veröffentlicht in: | IEEE journal of selected topics in quantum electronics 2002-07, Vol.8 (4), p.928-934 |
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| container_end_page | 934 |
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| container_title | IEEE journal of selected topics in quantum electronics |
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| creator | Bogaerts, W. Wiaux, V. Taillaert, D. Beckx, S. Luyssaert, B. Bienstman, P. Baets, R. |
| description | We demonstrate wavelength-scale photonic nanostructures, including photonic crystals, fabricated in silicon-on-insulator using deep ultraviolet (UV) lithography. We discuss the mass-manufacturing capabilities of deep UV lithography compared to e-beam lithography. This is illustrated with experimental results. Finally, we present some of the issues that arise when trying to use established complementary metal-oxide-semiconductor processes for the fabrication of photonic integrated circuits. |
| doi_str_mv | 10.1109/JSTQE.2002.800845 |
| format | Article |
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We discuss the mass-manufacturing capabilities of deep UV lithography compared to e-beam lithography. This is illustrated with experimental results. 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We discuss the mass-manufacturing capabilities of deep UV lithography compared to e-beam lithography. This is illustrated with experimental results. Finally, we present some of the issues that arise when trying to use established complementary metal-oxide-semiconductor processes for the fabrication of photonic integrated circuits.</description><subject>III-V semiconductor materials</subject><subject>Integrated circuits</subject><subject>Lithography</subject><subject>Nanocomposites</subject><subject>Nanomaterials</subject><subject>Nanostructure</subject><subject>Optical device fabrication</subject><subject>Optical fiber communication</subject><subject>Optical films</subject><subject>Optical refraction</subject><subject>Optical waveguides</subject><subject>Photonic crystals</subject><subject>Photonic integrated circuits</subject><subject>Photonics</subject><subject>Quantum electronics</subject><subject>Silicon on insulator technology</subject><issn>1077-260X</issn><issn>1558-4542</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2002</creationdate><recordtype>article</recordtype><sourceid>RIE</sourceid><recordid>eNp90ctKAzEUBuBBFLw-gLgJLnQ19SST61Kk9UJBxAu6CnGasSnTZExmFn17U-tCXAghyeL7Dxz-ojjGMMIY1MXd49PDeEQAyEgCSMq2ij3MmCwpo2Q7_0GIknB43S32U1rA2kjYK94m5j262vQueBQa1M1DH7yrUR1XqTdtQs6j5FpXB1_m43waWtOHiIbk_AciVJZ-iWbWduj5BbWun4ePaLr56rDYaXLeHv28B8XzZPx0dVNO769vry6nZU256EsqGlphRZRhMyUExoJIXmMGnEjGSQWUKyYs5zhfGQhbKZCGkndBZkCb6qA438ztYvgcbOr10qXatq3xNgxJKxCKSUZIlmf_SiKJoAA4w9M_cBGG6PMWWikiBa9AZoQ3qI4hpWgb3UW3NHGlMeh1J_q7E73uRG86yZmTTcZZa3_5SlFJqy_hAoVM</recordid><startdate>20020701</startdate><enddate>20020701</enddate><creator>Bogaerts, W.</creator><creator>Wiaux, V.</creator><creator>Taillaert, D.</creator><creator>Beckx, S.</creator><creator>Luyssaert, B.</creator><creator>Bienstman, P.</creator><creator>Baets, R.</creator><general>IEEE</general><general>The Institute of Electrical and Electronics Engineers, Inc. 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| ispartof | IEEE journal of selected topics in quantum electronics, 2002-07, Vol.8 (4), p.928-934 |
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| language | eng |
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| source | IEEE Electronic Library (IEL) |
| subjects | III-V semiconductor materials Integrated circuits Lithography Nanocomposites Nanomaterials Nanostructure Optical device fabrication Optical fiber communication Optical films Optical refraction Optical waveguides Photonic crystals Photonic integrated circuits Photonics Quantum electronics Silicon on insulator technology |
| title | Fabrication of photonic crystals in silicon-on-insulator using 248-nm deep UV lithography |
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