Switching Performance Assessment of Bilayer PtSe } Tunneling Field Effect Transistor
In this article, a bilayer tunneling FET based on the stacked structure of platinum diselenide (PtSe _{\text{2}}\text{)} monolayers is introduced. A p-type PtSe _{\text{2}} layer acts as the source region, while the drain region is composed of a passivated PtSe _{\text{2}} layer, that acts as a...
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Veröffentlicht in: | IEEE transactions on electron devices 2023-12, p.1-7 |
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Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | In this article, a bilayer tunneling FET based on the stacked structure of platinum diselenide (PtSe _{\text{2}}\text{)} monolayers is introduced. A p-type PtSe _{\text{2}} layer acts as the source region, while the drain region is composed of a passivated PtSe _{\text{2}} layer, that acts as a n-type layer. The switching performance of the device is investigated by the numerical simulations utilizing first principles calculations based on density functional theory (DFT). The study is carried out for different passivation atoms at different locations, and the results show that remarkable switching characteristics including subthreshold swing (SS) of about 21 mV/dec, ON-state current of about 880 \mu A/ \mu m, and on/off currents ratio of about 10 ^{\text{6}} are achievable. Such an impressive results indicate that the bilayer PtSe _{\text{2}} tunnel field effect transistor (TFET) is among the promising low-voltage transition metal dichalcogenide (TMD)-based switching devices. |
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ISSN: | 0018-9383 1557-9646 |
DOI: | 10.1109/TED.2023.3346366 |