Engineering Hf0.5Zr0.5O2 Ferroelectric Tunnel Junctions With Amorphous WOx Bottom Electrodes Achieving High Remanent Polarization and Record Low-Operating Voltage

Metal-ferroelectric (FE)-metal structures with amorphous WOx bottom electrodes (BEs) are experimentally and theoretically demonstrated to favor the FE orthorhombic phase formation. The ferroelectric tunnel junction (FTJ) using the amorphous WOx BE and ZrO2-HfO2 superlattice FE layer has a remanent p...

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Veröffentlicht in:IEEE transactions on electron devices 2023-10, Vol.70 (10), p.5022-5027
Hauptverfasser: Zhao, Zefu, Chen, Yu-Rui, Chen, Yun-Wen, Wang, Jer-Fu, Xing, Yifan, Ji, Wang, Chen, Guan-Hua, Lee, Jia-Yang, Dobhal, Rachit, Liu, C. W.
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container_end_page 5027
container_issue 10
container_start_page 5022
container_title IEEE transactions on electron devices
container_volume 70
creator Zhao, Zefu
Chen, Yu-Rui
Chen, Yun-Wen
Wang, Jer-Fu
Xing, Yifan
Ji, Wang
Chen, Guan-Hua
Lee, Jia-Yang
Dobhal, Rachit
Liu, C. W.
description Metal-ferroelectric (FE)-metal structures with amorphous WOx bottom electrodes (BEs) are experimentally and theoretically demonstrated to favor the FE orthorhombic phase formation. The ferroelectric tunnel junction (FTJ) using the amorphous WOx BE and ZrO2-HfO2 superlattice FE layer has a remanent polarization of 70~\mu \text{C} /cm2. The FTJ has high endurance of 1E12 and 1E8 cycles for the write operation with incomplete and complete polarization switching, respectively. The write and read voltages have record low values of 1.3 and −0.15 V, respectively. The −0.15-V read does not cause read disturbance due to no polarization switching. The thermal budget is as low as 450 °C.
doi_str_mv 10.1109/TED.2023.3308924
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fullrecord <record><control><sourceid>ieee_RIE</sourceid><recordid>TN_cdi_ieee_primary_10243553</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><ieee_id>10243553</ieee_id><sourcerecordid>10243553</sourcerecordid><originalsourceid>FETCH-LOGICAL-i176t-7df66e2414d0011aed3b7a19d3dd7de385b2a14a8b48b4461129b42e6dfcc1443</originalsourceid><addsrcrecordid>eNotj8tOwzAURL0AifLYs2DhH0jwK69lKS0FVQpCBSQ2lRPfJEaJXTkur8_hSzEFaXRHo9Ec6SJ0TklMKSku1_PrmBHGY85JXjBxgCaE0DwqeM6P0PE4voaYCsEm6HtuWm0AnDYtXjYkTl5cOCXDC3DOQg-1d7rG650x0OO7nam9tmbEz9p3eDpYt-3sLsTyA19Z7-2A5_uNVTDiad1peNujddvhBxikAePxve2l01_yF4WlUaGprVN4Zd-jcgsuFGHzZHsvWzhFh43sRzj79xP0uJivZ8toVd7czqarSNMs9VGmmjQFJqhQ4TsqQfEqk7RQXKlMAc-TikkqZF6JIJFSyopKMEhVU9dUCH6CLv64GgA2W6cH6T43lDDBk4TzHweVadg</addsrcrecordid><sourcetype>Publisher</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>Engineering Hf0.5Zr0.5O2 Ferroelectric Tunnel Junctions With Amorphous WOx Bottom Electrodes Achieving High Remanent Polarization and Record Low-Operating Voltage</title><source>IEEE Electronic Library (IEL)</source><creator>Zhao, Zefu ; Chen, Yu-Rui ; Chen, Yun-Wen ; Wang, Jer-Fu ; Xing, Yifan ; Ji, Wang ; Chen, Guan-Hua ; Lee, Jia-Yang ; Dobhal, Rachit ; Liu, C. W.</creator><creatorcontrib>Zhao, Zefu ; Chen, Yu-Rui ; Chen, Yun-Wen ; Wang, Jer-Fu ; Xing, Yifan ; Ji, Wang ; Chen, Guan-Hua ; Lee, Jia-Yang ; Dobhal, Rachit ; Liu, C. W.</creatorcontrib><description>Metal-ferroelectric (FE)-metal structures with amorphous WOx bottom electrodes (BEs) are experimentally and theoretically demonstrated to favor the FE orthorhombic phase formation. The ferroelectric tunnel junction (FTJ) using the amorphous WOx BE and ZrO2-HfO2 superlattice FE layer has a remanent polarization of &lt;inline-formula&gt; &lt;tex-math notation="LaTeX"&gt;70~\mu \text{C} &lt;/tex-math&gt;&lt;/inline-formula&gt;/cm2. The FTJ has high endurance of 1E12 and 1E8 cycles for the write operation with incomplete and complete polarization switching, respectively. The write and read voltages have record low values of 1.3 and −0.15 V, respectively. The −0.15-V read does not cause read disturbance due to no polarization switching. The thermal budget is as low as 450 °C.</description><identifier>ISSN: 0018-9383</identifier><identifier>DOI: 10.1109/TED.2023.3308924</identifier><identifier>CODEN: IETDAI</identifier><language>eng</language><publisher>IEEE</publisher><subject>amorphous WOₓ electrode ; Electrodes ; endurance ; FE tunnel junction (FTJ) ; ferroelectric (FE) ; Hafnium ; Hafnium oxide ; Iron ; remanent polarization ; superlattice ; Switches ; Tin ; Zirconium ; α-WOₓ/ZrO₂ interfaces</subject><ispartof>IEEE transactions on electron devices, 2023-10, Vol.70 (10), p.5022-5027</ispartof><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><orcidid>0000-0002-2977-5956 ; 0000-0003-0796-1659 ; 0000-0002-8236-0477 ; 0000-0002-6439-8754 ; 0009-0005-4156-531X ; 0000-0002-1564-7750</orcidid></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://ieeexplore.ieee.org/document/10243553$$EHTML$$P50$$Gieee$$H</linktohtml><link.rule.ids>314,780,784,796,27924,27925,54758</link.rule.ids><linktorsrc>$$Uhttps://ieeexplore.ieee.org/document/10243553$$EView_record_in_IEEE$$FView_record_in_$$GIEEE</linktorsrc></links><search><creatorcontrib>Zhao, Zefu</creatorcontrib><creatorcontrib>Chen, Yu-Rui</creatorcontrib><creatorcontrib>Chen, Yun-Wen</creatorcontrib><creatorcontrib>Wang, Jer-Fu</creatorcontrib><creatorcontrib>Xing, Yifan</creatorcontrib><creatorcontrib>Ji, Wang</creatorcontrib><creatorcontrib>Chen, Guan-Hua</creatorcontrib><creatorcontrib>Lee, Jia-Yang</creatorcontrib><creatorcontrib>Dobhal, Rachit</creatorcontrib><creatorcontrib>Liu, C. W.</creatorcontrib><title>Engineering Hf0.5Zr0.5O2 Ferroelectric Tunnel Junctions With Amorphous WOx Bottom Electrodes Achieving High Remanent Polarization and Record Low-Operating Voltage</title><title>IEEE transactions on electron devices</title><addtitle>TED</addtitle><description>Metal-ferroelectric (FE)-metal structures with amorphous WOx bottom electrodes (BEs) are experimentally and theoretically demonstrated to favor the FE orthorhombic phase formation. The ferroelectric tunnel junction (FTJ) using the amorphous WOx BE and ZrO2-HfO2 superlattice FE layer has a remanent polarization of &lt;inline-formula&gt; &lt;tex-math notation="LaTeX"&gt;70~\mu \text{C} &lt;/tex-math&gt;&lt;/inline-formula&gt;/cm2. The FTJ has high endurance of 1E12 and 1E8 cycles for the write operation with incomplete and complete polarization switching, respectively. The write and read voltages have record low values of 1.3 and −0.15 V, respectively. The −0.15-V read does not cause read disturbance due to no polarization switching. The thermal budget is as low as 450 °C.</description><subject>amorphous WOₓ electrode</subject><subject>Electrodes</subject><subject>endurance</subject><subject>FE tunnel junction (FTJ)</subject><subject>ferroelectric (FE)</subject><subject>Hafnium</subject><subject>Hafnium oxide</subject><subject>Iron</subject><subject>remanent polarization</subject><subject>superlattice</subject><subject>Switches</subject><subject>Tin</subject><subject>Zirconium</subject><subject>α-WOₓ/ZrO₂ interfaces</subject><issn>0018-9383</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2023</creationdate><recordtype>article</recordtype><sourceid>RIE</sourceid><recordid>eNotj8tOwzAURL0AifLYs2DhH0jwK69lKS0FVQpCBSQ2lRPfJEaJXTkur8_hSzEFaXRHo9Ec6SJ0TklMKSku1_PrmBHGY85JXjBxgCaE0DwqeM6P0PE4voaYCsEm6HtuWm0AnDYtXjYkTl5cOCXDC3DOQg-1d7rG650x0OO7nam9tmbEz9p3eDpYt-3sLsTyA19Z7-2A5_uNVTDiad1peNujddvhBxikAePxve2l01_yF4WlUaGprVN4Zd-jcgsuFGHzZHsvWzhFh43sRzj79xP0uJivZ8toVd7czqarSNMs9VGmmjQFJqhQ4TsqQfEqk7RQXKlMAc-TikkqZF6JIJFSyopKMEhVU9dUCH6CLv64GgA2W6cH6T43lDDBk4TzHweVadg</recordid><startdate>202310</startdate><enddate>202310</enddate><creator>Zhao, Zefu</creator><creator>Chen, Yu-Rui</creator><creator>Chen, Yun-Wen</creator><creator>Wang, Jer-Fu</creator><creator>Xing, Yifan</creator><creator>Ji, Wang</creator><creator>Chen, Guan-Hua</creator><creator>Lee, Jia-Yang</creator><creator>Dobhal, Rachit</creator><creator>Liu, C. W.</creator><general>IEEE</general><scope>97E</scope><scope>RIA</scope><scope>RIE</scope><orcidid>https://orcid.org/0000-0002-2977-5956</orcidid><orcidid>https://orcid.org/0000-0003-0796-1659</orcidid><orcidid>https://orcid.org/0000-0002-8236-0477</orcidid><orcidid>https://orcid.org/0000-0002-6439-8754</orcidid><orcidid>https://orcid.org/0009-0005-4156-531X</orcidid><orcidid>https://orcid.org/0000-0002-1564-7750</orcidid></search><sort><creationdate>202310</creationdate><title>Engineering Hf0.5Zr0.5O2 Ferroelectric Tunnel Junctions With Amorphous WOx Bottom Electrodes Achieving High Remanent Polarization and Record Low-Operating Voltage</title><author>Zhao, Zefu ; Chen, Yu-Rui ; Chen, Yun-Wen ; Wang, Jer-Fu ; Xing, Yifan ; Ji, Wang ; Chen, Guan-Hua ; Lee, Jia-Yang ; Dobhal, Rachit ; Liu, C. W.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-i176t-7df66e2414d0011aed3b7a19d3dd7de385b2a14a8b48b4461129b42e6dfcc1443</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2023</creationdate><topic>amorphous WOₓ electrode</topic><topic>Electrodes</topic><topic>endurance</topic><topic>FE tunnel junction (FTJ)</topic><topic>ferroelectric (FE)</topic><topic>Hafnium</topic><topic>Hafnium oxide</topic><topic>Iron</topic><topic>remanent polarization</topic><topic>superlattice</topic><topic>Switches</topic><topic>Tin</topic><topic>Zirconium</topic><topic>α-WOₓ/ZrO₂ interfaces</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Zhao, Zefu</creatorcontrib><creatorcontrib>Chen, Yu-Rui</creatorcontrib><creatorcontrib>Chen, Yun-Wen</creatorcontrib><creatorcontrib>Wang, Jer-Fu</creatorcontrib><creatorcontrib>Xing, Yifan</creatorcontrib><creatorcontrib>Ji, Wang</creatorcontrib><creatorcontrib>Chen, Guan-Hua</creatorcontrib><creatorcontrib>Lee, Jia-Yang</creatorcontrib><creatorcontrib>Dobhal, Rachit</creatorcontrib><creatorcontrib>Liu, C. W.</creatorcontrib><collection>IEEE All-Society Periodicals Package (ASPP) 2005-present</collection><collection>IEEE All-Society Periodicals Package (ASPP) 1998-Present</collection><collection>IEEE Electronic Library (IEL)</collection><jtitle>IEEE transactions on electron devices</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Zhao, Zefu</au><au>Chen, Yu-Rui</au><au>Chen, Yun-Wen</au><au>Wang, Jer-Fu</au><au>Xing, Yifan</au><au>Ji, Wang</au><au>Chen, Guan-Hua</au><au>Lee, Jia-Yang</au><au>Dobhal, Rachit</au><au>Liu, C. W.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Engineering Hf0.5Zr0.5O2 Ferroelectric Tunnel Junctions With Amorphous WOx Bottom Electrodes Achieving High Remanent Polarization and Record Low-Operating Voltage</atitle><jtitle>IEEE transactions on electron devices</jtitle><stitle>TED</stitle><date>2023-10</date><risdate>2023</risdate><volume>70</volume><issue>10</issue><spage>5022</spage><epage>5027</epage><pages>5022-5027</pages><issn>0018-9383</issn><coden>IETDAI</coden><abstract>Metal-ferroelectric (FE)-metal structures with amorphous WOx bottom electrodes (BEs) are experimentally and theoretically demonstrated to favor the FE orthorhombic phase formation. The ferroelectric tunnel junction (FTJ) using the amorphous WOx BE and ZrO2-HfO2 superlattice FE layer has a remanent polarization of &lt;inline-formula&gt; &lt;tex-math notation="LaTeX"&gt;70~\mu \text{C} &lt;/tex-math&gt;&lt;/inline-formula&gt;/cm2. The FTJ has high endurance of 1E12 and 1E8 cycles for the write operation with incomplete and complete polarization switching, respectively. The write and read voltages have record low values of 1.3 and −0.15 V, respectively. The −0.15-V read does not cause read disturbance due to no polarization switching. The thermal budget is as low as 450 °C.</abstract><pub>IEEE</pub><doi>10.1109/TED.2023.3308924</doi><tpages>6</tpages><orcidid>https://orcid.org/0000-0002-2977-5956</orcidid><orcidid>https://orcid.org/0000-0003-0796-1659</orcidid><orcidid>https://orcid.org/0000-0002-8236-0477</orcidid><orcidid>https://orcid.org/0000-0002-6439-8754</orcidid><orcidid>https://orcid.org/0009-0005-4156-531X</orcidid><orcidid>https://orcid.org/0000-0002-1564-7750</orcidid></addata></record>
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subjects amorphous WOₓ electrode
Electrodes
endurance
FE tunnel junction (FTJ)
ferroelectric (FE)
Hafnium
Hafnium oxide
Iron
remanent polarization
superlattice
Switches
Tin
Zirconium
α-WOₓ/ZrO₂ interfaces
title Engineering Hf0.5Zr0.5O2 Ferroelectric Tunnel Junctions With Amorphous WOx Bottom Electrodes Achieving High Remanent Polarization and Record Low-Operating Voltage
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-21T10%3A16%3A14IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-ieee_RIE&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Engineering%20Hf0.5Zr0.5O2%20Ferroelectric%20Tunnel%20Junctions%20With%20Amorphous%20WOx%20Bottom%20Electrodes%20Achieving%20High%20Remanent%20Polarization%20and%20Record%20Low-Operating%20Voltage&rft.jtitle=IEEE%20transactions%20on%20electron%20devices&rft.au=Zhao,%20Zefu&rft.date=2023-10&rft.volume=70&rft.issue=10&rft.spage=5022&rft.epage=5027&rft.pages=5022-5027&rft.issn=0018-9383&rft.coden=IETDAI&rft_id=info:doi/10.1109/TED.2023.3308924&rft_dat=%3Cieee_RIE%3E10243553%3C/ieee_RIE%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rft_ieee_id=10243553&rfr_iscdi=true