Engineering Hf0.5Zr0.5O2 Ferroelectric Tunnel Junctions With Amorphous WOx Bottom Electrodes Achieving High Remanent Polarization and Record Low-Operating Voltage
Metal-ferroelectric (FE)-metal structures with amorphous WOx bottom electrodes (BEs) are experimentally and theoretically demonstrated to favor the FE orthorhombic phase formation. The ferroelectric tunnel junction (FTJ) using the amorphous WOx BE and ZrO2-HfO2 superlattice FE layer has a remanent p...
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Veröffentlicht in: | IEEE transactions on electron devices 2023-10, Vol.70 (10), p.5022-5027 |
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creator | Zhao, Zefu Chen, Yu-Rui Chen, Yun-Wen Wang, Jer-Fu Xing, Yifan Ji, Wang Chen, Guan-Hua Lee, Jia-Yang Dobhal, Rachit Liu, C. W. |
description | Metal-ferroelectric (FE)-metal structures with amorphous WOx bottom electrodes (BEs) are experimentally and theoretically demonstrated to favor the FE orthorhombic phase formation. The ferroelectric tunnel junction (FTJ) using the amorphous WOx BE and ZrO2-HfO2 superlattice FE layer has a remanent polarization of 70~\mu \text{C} /cm2. The FTJ has high endurance of 1E12 and 1E8 cycles for the write operation with incomplete and complete polarization switching, respectively. The write and read voltages have record low values of 1.3 and −0.15 V, respectively. The −0.15-V read does not cause read disturbance due to no polarization switching. The thermal budget is as low as 450 °C. |
doi_str_mv | 10.1109/TED.2023.3308924 |
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W.</creator><creatorcontrib>Zhao, Zefu ; Chen, Yu-Rui ; Chen, Yun-Wen ; Wang, Jer-Fu ; Xing, Yifan ; Ji, Wang ; Chen, Guan-Hua ; Lee, Jia-Yang ; Dobhal, Rachit ; Liu, C. W.</creatorcontrib><description>Metal-ferroelectric (FE)-metal structures with amorphous WOx bottom electrodes (BEs) are experimentally and theoretically demonstrated to favor the FE orthorhombic phase formation. The ferroelectric tunnel junction (FTJ) using the amorphous WOx BE and ZrO2-HfO2 superlattice FE layer has a remanent polarization of <inline-formula> <tex-math notation="LaTeX">70~\mu \text{C} </tex-math></inline-formula>/cm2. The FTJ has high endurance of 1E12 and 1E8 cycles for the write operation with incomplete and complete polarization switching, respectively. The write and read voltages have record low values of 1.3 and −0.15 V, respectively. The −0.15-V read does not cause read disturbance due to no polarization switching. The thermal budget is as low as 450 °C.</description><identifier>ISSN: 0018-9383</identifier><identifier>DOI: 10.1109/TED.2023.3308924</identifier><identifier>CODEN: IETDAI</identifier><language>eng</language><publisher>IEEE</publisher><subject>amorphous WOₓ electrode ; Electrodes ; endurance ; FE tunnel junction (FTJ) ; ferroelectric (FE) ; Hafnium ; Hafnium oxide ; Iron ; remanent polarization ; superlattice ; Switches ; Tin ; Zirconium ; α-WOₓ/ZrO₂ interfaces</subject><ispartof>IEEE transactions on electron devices, 2023-10, Vol.70 (10), p.5022-5027</ispartof><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><orcidid>0000-0002-2977-5956 ; 0000-0003-0796-1659 ; 0000-0002-8236-0477 ; 0000-0002-6439-8754 ; 0009-0005-4156-531X ; 0000-0002-1564-7750</orcidid></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://ieeexplore.ieee.org/document/10243553$$EHTML$$P50$$Gieee$$H</linktohtml><link.rule.ids>314,780,784,796,27924,27925,54758</link.rule.ids><linktorsrc>$$Uhttps://ieeexplore.ieee.org/document/10243553$$EView_record_in_IEEE$$FView_record_in_$$GIEEE</linktorsrc></links><search><creatorcontrib>Zhao, Zefu</creatorcontrib><creatorcontrib>Chen, Yu-Rui</creatorcontrib><creatorcontrib>Chen, Yun-Wen</creatorcontrib><creatorcontrib>Wang, Jer-Fu</creatorcontrib><creatorcontrib>Xing, Yifan</creatorcontrib><creatorcontrib>Ji, Wang</creatorcontrib><creatorcontrib>Chen, Guan-Hua</creatorcontrib><creatorcontrib>Lee, Jia-Yang</creatorcontrib><creatorcontrib>Dobhal, Rachit</creatorcontrib><creatorcontrib>Liu, C. W.</creatorcontrib><title>Engineering Hf0.5Zr0.5O2 Ferroelectric Tunnel Junctions With Amorphous WOx Bottom Electrodes Achieving High Remanent Polarization and Record Low-Operating Voltage</title><title>IEEE transactions on electron devices</title><addtitle>TED</addtitle><description>Metal-ferroelectric (FE)-metal structures with amorphous WOx bottom electrodes (BEs) are experimentally and theoretically demonstrated to favor the FE orthorhombic phase formation. The ferroelectric tunnel junction (FTJ) using the amorphous WOx BE and ZrO2-HfO2 superlattice FE layer has a remanent polarization of <inline-formula> <tex-math notation="LaTeX">70~\mu \text{C} </tex-math></inline-formula>/cm2. The FTJ has high endurance of 1E12 and 1E8 cycles for the write operation with incomplete and complete polarization switching, respectively. The write and read voltages have record low values of 1.3 and −0.15 V, respectively. The −0.15-V read does not cause read disturbance due to no polarization switching. The thermal budget is as low as 450 °C.</description><subject>amorphous WOₓ electrode</subject><subject>Electrodes</subject><subject>endurance</subject><subject>FE tunnel junction (FTJ)</subject><subject>ferroelectric (FE)</subject><subject>Hafnium</subject><subject>Hafnium oxide</subject><subject>Iron</subject><subject>remanent polarization</subject><subject>superlattice</subject><subject>Switches</subject><subject>Tin</subject><subject>Zirconium</subject><subject>α-WOₓ/ZrO₂ interfaces</subject><issn>0018-9383</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2023</creationdate><recordtype>article</recordtype><sourceid>RIE</sourceid><recordid>eNotj8tOwzAURL0AifLYs2DhH0jwK69lKS0FVQpCBSQ2lRPfJEaJXTkur8_hSzEFaXRHo9Ec6SJ0TklMKSku1_PrmBHGY85JXjBxgCaE0DwqeM6P0PE4voaYCsEm6HtuWm0AnDYtXjYkTl5cOCXDC3DOQg-1d7rG650x0OO7nam9tmbEz9p3eDpYt-3sLsTyA19Z7-2A5_uNVTDiad1peNujddvhBxikAePxve2l01_yF4WlUaGprVN4Zd-jcgsuFGHzZHsvWzhFh43sRzj79xP0uJivZ8toVd7czqarSNMs9VGmmjQFJqhQ4TsqQfEqk7RQXKlMAc-TikkqZF6JIJFSyopKMEhVU9dUCH6CLv64GgA2W6cH6T43lDDBk4TzHweVadg</recordid><startdate>202310</startdate><enddate>202310</enddate><creator>Zhao, Zefu</creator><creator>Chen, Yu-Rui</creator><creator>Chen, Yun-Wen</creator><creator>Wang, Jer-Fu</creator><creator>Xing, Yifan</creator><creator>Ji, Wang</creator><creator>Chen, Guan-Hua</creator><creator>Lee, Jia-Yang</creator><creator>Dobhal, Rachit</creator><creator>Liu, C. W.</creator><general>IEEE</general><scope>97E</scope><scope>RIA</scope><scope>RIE</scope><orcidid>https://orcid.org/0000-0002-2977-5956</orcidid><orcidid>https://orcid.org/0000-0003-0796-1659</orcidid><orcidid>https://orcid.org/0000-0002-8236-0477</orcidid><orcidid>https://orcid.org/0000-0002-6439-8754</orcidid><orcidid>https://orcid.org/0009-0005-4156-531X</orcidid><orcidid>https://orcid.org/0000-0002-1564-7750</orcidid></search><sort><creationdate>202310</creationdate><title>Engineering Hf0.5Zr0.5O2 Ferroelectric Tunnel Junctions With Amorphous WOx Bottom Electrodes Achieving High Remanent Polarization and Record Low-Operating Voltage</title><author>Zhao, Zefu ; Chen, Yu-Rui ; Chen, Yun-Wen ; Wang, Jer-Fu ; Xing, Yifan ; Ji, Wang ; Chen, Guan-Hua ; Lee, Jia-Yang ; Dobhal, Rachit ; Liu, C. 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W.</creatorcontrib><collection>IEEE All-Society Periodicals Package (ASPP) 2005-present</collection><collection>IEEE All-Society Periodicals Package (ASPP) 1998-Present</collection><collection>IEEE Electronic Library (IEL)</collection><jtitle>IEEE transactions on electron devices</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Zhao, Zefu</au><au>Chen, Yu-Rui</au><au>Chen, Yun-Wen</au><au>Wang, Jer-Fu</au><au>Xing, Yifan</au><au>Ji, Wang</au><au>Chen, Guan-Hua</au><au>Lee, Jia-Yang</au><au>Dobhal, Rachit</au><au>Liu, C. W.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Engineering Hf0.5Zr0.5O2 Ferroelectric Tunnel Junctions With Amorphous WOx Bottom Electrodes Achieving High Remanent Polarization and Record Low-Operating Voltage</atitle><jtitle>IEEE transactions on electron devices</jtitle><stitle>TED</stitle><date>2023-10</date><risdate>2023</risdate><volume>70</volume><issue>10</issue><spage>5022</spage><epage>5027</epage><pages>5022-5027</pages><issn>0018-9383</issn><coden>IETDAI</coden><abstract>Metal-ferroelectric (FE)-metal structures with amorphous WOx bottom electrodes (BEs) are experimentally and theoretically demonstrated to favor the FE orthorhombic phase formation. The ferroelectric tunnel junction (FTJ) using the amorphous WOx BE and ZrO2-HfO2 superlattice FE layer has a remanent polarization of <inline-formula> <tex-math notation="LaTeX">70~\mu \text{C} </tex-math></inline-formula>/cm2. The FTJ has high endurance of 1E12 and 1E8 cycles for the write operation with incomplete and complete polarization switching, respectively. The write and read voltages have record low values of 1.3 and −0.15 V, respectively. The −0.15-V read does not cause read disturbance due to no polarization switching. The thermal budget is as low as 450 °C.</abstract><pub>IEEE</pub><doi>10.1109/TED.2023.3308924</doi><tpages>6</tpages><orcidid>https://orcid.org/0000-0002-2977-5956</orcidid><orcidid>https://orcid.org/0000-0003-0796-1659</orcidid><orcidid>https://orcid.org/0000-0002-8236-0477</orcidid><orcidid>https://orcid.org/0000-0002-6439-8754</orcidid><orcidid>https://orcid.org/0009-0005-4156-531X</orcidid><orcidid>https://orcid.org/0000-0002-1564-7750</orcidid></addata></record> |
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subjects | amorphous WOₓ electrode Electrodes endurance FE tunnel junction (FTJ) ferroelectric (FE) Hafnium Hafnium oxide Iron remanent polarization superlattice Switches Tin Zirconium α-WOₓ/ZrO₂ interfaces |
title | Engineering Hf0.5Zr0.5O2 Ferroelectric Tunnel Junctions With Amorphous WOx Bottom Electrodes Achieving High Remanent Polarization and Record Low-Operating Voltage |
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